Ozone Gas Delivery Systems
MKS ozone gas delivery systems provide field-proven, high concentration, ultra-clean ozone generation for advanced thin film applications such as Atomic Layer Deposition (ALD), Chemical Vapor Deposition (CVD), Tetraethyl Orthosilicate (TEOS)/Ozone CVD (HDSACVD), contaminant removal and oxide growth. Gas delivery models have integrated ozone concentration monitoring, flow control, and power distribution. Additional system options include safety monitoring, status indicators and ozone destruction capability.
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Product
Multi-Channel Ozone Delivery System With In-rack Chiller
SEMOZON® AX8575
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The SEMOZON® AX8575 is a fully integrated, high output ozone gas delivery system that can be configured as a multi-channel system delivering ozone for up to 4 channels supporting multiple chambers or multiple tools. It has an optional in-rack chiller for ultra-high concentrations.
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Product
Fully Integrated Modular Ozone Delivery System
SEMOZON® AX8580
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The SEMOZON® AX8580 Ozone Delivery System generates and delivers high flow, high concentration, ultra-clean ozone for advanced thin film applications. The SEMOZON AX8580 is specifically designed for use with an increasing number of semiconductor process applications such as ALD, CVD and TEOS/Ozone CVD.
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Product
Stand-alone Ozone Delivery System For Advanced Processes
SEMOZON® AX8585
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SEMOZON® AX8585 stand-alone ozone gas delivery system is designed around the AX8410 PRIME ozone generator to provide high flow, high concentration, ultra clean ozone generation and delivery. This fully configurable product line is designed to meet the ever changing needs of the semiconductor industry. Each SEMOZON AX8585 is a fully integrated, high output ozone gas delivery system intended for use in an increasing number of semiconductor process applications such as ALD, CVD, TEOS/Ozone CVD, photoresist strip, wafer cleaning, contaminant removal, and oxide growth.
