MKS Instruments
MKS Instruments, Inc. is a global provider of instruments, subsystems and process control solutions that measure, control, power, monitor, and analyze critical parameters of advanced manufacturing processes to improve process performance and productivity.
- 978-645-5500
- 2 Tech Drive
Suite 201
Andover, MA 01810
United States of America
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Product
High Performance Heated Absolute Pressure Transducers
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These high performance Baratron® capacitance manometers have the sensor located in a temperature controlled constant temperature oven for improved accuracy. They are available with an analog output or digital communications for measuring absolute pressure.
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Product
Process Automation Controllers
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As innovators in programmable control, communication protocols, embedded analytics, and gateway technology, MKS has the critical building blocks and experience to deliver the latest technologies for distributed automation control and process monitoring to our customers, personalized for their exact requirements.
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Product
Tunable Filter Spectrometers
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MKS Instruments' platform of innovative optical analyzers based on Tunable Filter Spectroscopy (TFS™) provides real-time gas analysis, while delivering customers a substantially lower total cost of ownership. TFS™ can be utilized from UV (Ultra-Violet) through IR (Infra-Red) spectral regions. MKS TFS™ sensor platforms have been on the market since 2008 with more than 2500 systems deployed.
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Product
Process And Chamber Monitoring Software & Systems
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MKS process and monitoring solutions feature real-time, web-enabled, hardware, software, and systems to support a variety of tools and processes. These solutions improve performance and yield while reducing tool damage and false alarms.
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Product
Process Sense™ NDIR End Point Detector For Chamber Clean
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The Process Sense endpoint sensor is a small, low-cost SiF4 sensor specifically designed for Remote Plasma Chamber Clean Endpoint detection for silicon-based CVD deposition chambers. Process Sense is based on infrared absorption, the only technique applicable to all plasma cleaning processes (in-situ and remote). It gets mounted onto a bypass on the rough line, ensuring no effect on deposition hardware. The signal level reported by the Process Sense, which is proportional to SiF4 concentration, can be used to determine the completion of the chamber clean process.
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Product
Industrial Pressure Transducers
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These industrial Baratron® capacitance manometers feature industrial enclosures and higher operating temperature ranges for industrial pressure measurement applications.
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Product
Fast and Repeatable Mass Flow Controllers
G-Series
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G-Series Mass Flow Controllers and Meters are cost effective thermal flow controllers with fast and repeatable performance that are well suited for most industries and applications.
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Product
GHW Series 13.56 MHz, 1.25, 2.5, And 5.0 KW High-Reliability RF Plasma Generators
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The GHW Series RF power generators deliver maximum rated output powers of 1250, 2500 and 5000 Watts at a frequency of 13.56 MHz. The GHW generators offer field-proven reliability, exceptional stability, and unsurpassed repeatability for high uptime and process yield. They are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.
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Product
Chemical Downstream Plasma Source
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The AX7610 is a microwave plasma source for remote plasma applications. With replaceable quartz or sapphire plasma tubes, the AX7610 downstream source offers configuration flexibility to meet the most demanding application process parameters. The quartz tube version is ideally suited for production of atomic oxygen, nitrogen or argon. The sapphire tube version is compatible with much more severe CF4 CHF3 and NF3 chemistries.
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Product
High Power Microwave Plasma Source
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The High Power Microwave Plasma Source can be combined with a 6kW microwave generator for a high concentration of radicals providing a high productivity manufacturing solution. The High Power Microwave Plasma source is capable of igniting in multiple process gases, over a wide operating range with performance benefits in current and emerging applications such as, high throughput photoresist removal, advanced surface cleaning and conditioning, as well as, advanced deposition applications at the atomic level.
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Product
General Performance Absolute Pressure Transducers
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These general performance Baratron® capacitance manometers are referenced to vacuum for absolute pressure measurement applications.
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Product
DELTA™ III 3-zone Flow Ratio Controller
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The DELTA™ III Flow Ratio Controller divides and controls mixed process gas flows to three chambers or zones within a process chamber at proportions specified by the user to optimize process uniformity and repeatability. Available with EtherCAT® or DeviceNet™ communications, this device provides the latest in gas flow ratio measurement and control technology.
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Product
IP66 Rated Mass Flow Controllers
I-Series
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I-Series Thermal Mass Flow Controllers are designed specifically for mass flow controller applications in harsh environments to protect against water and dust. The IP66-rated enclosure for I-Series Mass Flow Controllers protect it from direct water spray as well as dusty environments.


















