MKS Instruments
MKS Instruments, Inc. is a global provider of instruments, subsystems and process control solutions that measure, control, power, monitor, and analyze critical parameters of advanced manufacturing processes to improve process performance and productivity.
- 978-645-5500
- 2 Tech Drive
Suite 201
Andover, MA 01810
United States of America
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Product
Fully Integrated Modular Ozone Delivery System
SEMOZON® AX8580
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The SEMOZON® AX8580 Ozone Delivery System generates and delivers high flow, high concentration, ultra-clean ozone for advanced thin film applications. The SEMOZON AX8580 is specifically designed for use with an increasing number of semiconductor process applications such as ALD, CVD and TEOS/Ozone CVD.
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Product
Industrial Differential Pressure Transducers
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These industrial Baratron® capacitance manometers feature differential pressure measurement, industrial enclosures, and higher operating temperature ranges for industrial applications.
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Product
Dissolved Ammonia Delivery System
DI-NH3
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MKS' DI-NH3 is a compact, stand-alone system providing dissolved ammonia water. With Semiconductor 3D IC architectures using new materials like Cu-Co and Si-SiGe, the ability to wet clean with precise alkaline chemistries is growing in frequency and importance. The DI-NH3 delivers dissolved ammonia, providing optimal cleaning capability in an alkaline chemistry, minimizing material loss and contamination and inhibiting Electrostatic Discharge (ESD). Using closed-loop control, conductivity and pressure are kept stable under changing flow conditions. The dissolved ammonia concentration is monitored and adjusted, delivering the specific NH4OH concentration needed. Dissolved ammonia’s alkaline chemistry provides ESD protection during rinsing, particle lift-off, and residual photoresist removal in middle-of-line (MOL) and prevents corrosion of cobalt/copper interfaces.
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Product
General Performance Absolute Pressure Switches
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These absolute vacuum / pressure switches offer fast, accurate, and reliable protection for vacuum equipment and processes. Designed for applications where a DC signal output is not required, these pressure switches provide relay outputs that are readily interfaced with alarms, valve actuators, computers, process controllers, or other protection devices.
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Product
High Accuracy In-Situ Mass Flow Verifier
HA-MFV
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The HA-MFV, High Accuracy Mass Flow Verifier is designed for use on process tools to verify mass flow control flow rates in-situ. Available with EtherCAT® or DeviceNet™ communications and measurement accuracy of 1.0% of reading, the HA-MFV can verify MFC flow with the actual process gas significantly better than older rate-of-rise devices or process chamber rate-of rise methods.
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Product
Ozone Generators & Systems
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MKS offers a wide range of ozone generators and modular delivery systems which produce ultra-pure, reliable ozone gas. In the clean semiconductor environment, Ozone reacts with a wide range of precursor gases resulting in the creation of Al2O3, ZrO2, HfO2, and La2O3 metal oxides to enable thin film deposition processes like Atomic Layer Deposition (ALD) and Etch (ALE). MKS’ generator uses Grade 6 gas, enabling the creation of higher film density improving product yield. Photovoltaic and Display manufacturing leverage semiconductor best practices and utilize ozone to create enhanced thin film barriers, improving product performance and reliability.
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Product
Granville-Phillips® 835 Vacuum Quality Monitor System
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The Granville-Phillips® Series 835 Vacuum Quality Monitor (VQM™) combines the highest performance gas analysis technology with intelligent functional design that transforms complex measurement into actionable information. The 835 VQM is the world's fastest, lowest power mass spectrometer with full data collection, spectral deconvolution, and data logging at 85 ms capture rates for the full 1-145 amu measurement range or 125 ms for 1-300 amu.
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Product
DELTA™ II 2-zone Flow Ratio Controller
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The DELTA™ II Flow Ratio Controller divides and controls mixed process gas flows to either multiple chambers or zones within a process chamber at ratios specified by the user maximizing process uniformity and repeatability. It is available with EtherCAT® or DeviceNet™ communications.
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Product
Fast and Repeatable Mass Flow Controllers
G-Series
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G-Series Mass Flow Controllers and Meters are cost effective thermal flow controllers with fast and repeatable performance that are well suited for most industries and applications.
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Product
Mass Spectrometers
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Our wide range of powerful, versatile, and proven mass spectrometry-based solutions deliver a new level of understanding and control in vacuum and gas-related applications to customers.
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Product
Paragon® 8.0 Slm NF3 Flow Intelligent Remote Plasma Source
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For cleaning CVD and ALD/ALE process chambers, the Paragon remote plasma source is designed for high gas dissociation rates (> 98%) of NF3 with gas flows up to 8 slm and pressures up to 10 Torr. This leading-edge performance translates into increased process throughput and repeatable process results. The Paragon design incorporates a proprietary plasma block design with a Plasma Electrolytic Oxidation coating for low particle, long block life that delivers lower cost of ownership.
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Product
Automation Controllers And Modules
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Our complete automation platform solution along with a suite of automation control hardware and software configurable modules allow semiconductor and other industrial manufacturing customers to better automate their processes through computer-controlled automation and seamlessly integrate with existing MKS products to provide a complete solution.
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Product
High Performance Mass Flow Controllers
P-Series
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P-Series High Performance Multi-gas, Multi-range, Thermal Mass Flow Controllers are designed for the most critical process applications where accuracy, repeatability as well as pressure insensitivity are requirements.
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Product
Vapor Source Mass Flow Controller With Viscous Laminar Flow
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The 1152C Vapor Source Mass Flow Controller is a pressure-based measurement and control system designed to meter and control vapor from low vapor pressure liquid and solid sources directly, without the need of a carrier gas. The 1152C consists of a fixed flow element and two capacitance manometers for flow measurement, with a proportioning solenoid control valve for flow control.


















