MKS Instruments
MKS Instruments, Inc. is a global provider of instruments, subsystems and process control solutions that measure, control, power, monitor, and analyze critical parameters of advanced manufacturing processes to improve process performance and productivity.
- 978-645-5500
- 2 Tech Drive
Suite 201
Andover, MA 01810
United States of America
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Product
Process And Chamber Monitoring Software & Systems
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MKS process and monitoring solutions feature real-time, web-enabled, hardware, software, and systems to support a variety of tools and processes. These solutions improve performance and yield while reducing tool damage and false alarms.
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Product
Compact Pressure Switches
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These vacuum pressure switches based on Baratron® capacitance manometer technology provide relay outputs that are readily interfaced with alarms, valve actuators, computers, process controllers, load locks and other protection devices.
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Product
DELTA™ III 3-zone Flow Ratio Controller
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The DELTA™ III Flow Ratio Controller divides and controls mixed process gas flows to three chambers or zones within a process chamber at proportions specified by the user to optimize process uniformity and repeatability. Available with EtherCAT® or DeviceNet™ communications, this device provides the latest in gas flow ratio measurement and control technology.
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Product
Precisive® 5 Application Specific Gas Analyzers
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The Precisive® Gas Analyzer is a real-time gas analyzer based on MKS' unique Tunable Filter Spectroscopy (TFS™) platform. The Precisive suite of products are calibrated for the measurement of a wide range of gases across multiple process industries. The real-time, continuous measurement capability provides immediate analysis ensuring control of critical process parameters.
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Product
Micro-Baratron® Pressure Transducers
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Micro-Baratron® pressure transducers are ideally suited for use in delivery systems that feed ultrapure gases to critical process systems. Their wetted surfaces exposed to the gas stream have a finish of better than 5 µin Ra. These transducers exhibit superior dry-down characteristics, and contribute no particles above background.
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Product
Ozone Gas Generators
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SEMOZON® Ozone gas generators and subsystems are the industry standard for compact, high concentration, ultra-clean ozone gas generation. Applications include Atomic Layer Deposition (ALD), Atomic Layer Etch (ALE), Chemical Vapor Deposition (CVD) and Wet Cleaning.
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Product
Remote Plasma Sources For Process Applications
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MKS remote plasma sources deliver high density reactive radicals improving on-wafer cleaning and deposition throughput. Solutions consist of a fully integrated, self-contained unit designed for quick on-chamber installation providing fast, reliable plasma ignition of O2, Hydrogen and Nitrogen gases in a customer configurable package. All solutions are equipped with intelligent power control and EtherCAT® diagnostics supporting Industry 4.0.
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Product
DELTA™ II 2-zone Flow Ratio Controller
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The DELTA™ II Flow Ratio Controller divides and controls mixed process gas flows to either multiple chambers or zones within a process chamber at ratios specified by the user maximizing process uniformity and repeatability. It is available with EtherCAT® or DeviceNet™ communications.
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Product
Process Automation Controllers
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As innovators in programmable control, communication protocols, embedded analytics, and gateway technology, MKS has the critical building blocks and experience to deliver the latest technologies for distributed automation control and process monitoring to our customers, personalized for their exact requirements.
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Product
2450 MHz Industrial Microwave Generators
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Alter® 2450 MHz Industrial Microwave Generators are built on MKS Alter® Product experience and designed with rugged and reliable switch mode power supplies for demanding industrial applications. They offer compact generators up to 3kW in a 19 inch standard rack with a remote head and integrated isolator.
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Product
Process Sense™ NDIR End Point Detector For Chamber Clean
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The Process Sense endpoint sensor is a small, low-cost SiF4 sensor specifically designed for Remote Plasma Chamber Clean Endpoint detection for silicon-based CVD deposition chambers. Process Sense is based on infrared absorption, the only technique applicable to all plasma cleaning processes (in-situ and remote). It gets mounted onto a bypass on the rough line, ensuring no effect on deposition hardware. The signal level reported by the Process Sense, which is proportional to SiF4 concentration, can be used to determine the completion of the chamber clean process.
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Product
Paragon® 8.0 Slm NF3 Flow Intelligent Remote Plasma Source
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For cleaning CVD and ALD/ALE process chambers, the Paragon remote plasma source is designed for high gas dissociation rates (> 98%) of NF3 with gas flows up to 8 slm and pressures up to 10 Torr. This leading-edge performance translates into increased process throughput and repeatable process results. The Paragon design incorporates a proprietary plasma block design with a Plasma Electrolytic Oxidation coating for low particle, long block life that delivers lower cost of ownership.
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Product
Vacuum Pressure Sensors
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MKS, Granville-Phillips® Vacuum Gauges & Sensors cover a broad spectrum of vacuum measurement solutions.
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Product
Multi-Channel Ozone Delivery System With In-rack Chiller
SEMOZON® AX8575
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The SEMOZON® AX8575 is a fully integrated, high output ozone gas delivery system that can be configured as a multi-channel system delivering ozone for up to 4 channels supporting multiple chambers or multiple tools. It has an optional in-rack chiller for ultra-high concentrations.
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Product
Industrial Absolute Pressure Transducers
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These industrial Baratron® capacitance manometers feature absolute pressure measurement, industrial enclosures, and higher operating temperature ranges for industrial applications.


















