MKS Instruments
MKS Instruments, Inc. is a global provider of instruments, subsystems and process control solutions that measure, control, power, monitor, and analyze critical parameters of advanced manufacturing processes to improve process performance and productivity.
- 978-645-5500
- 2 Tech Drive
Suite 201
Andover, MA 01810
United States of America
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Product
Reference Pressure Transducers
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These Baratron® capacitance manometers offer our highest level of presure measurement accuracy making them ideal for calibration transfer standards.
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Product
Granville-Phillips® 835 Vacuum Quality Monitor System
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The Granville-Phillips® Series 835 Vacuum Quality Monitor (VQM™) combines the highest performance gas analysis technology with intelligent functional design that transforms complex measurement into actionable information. The 835 VQM is the world's fastest, lowest power mass spectrometer with full data collection, spectral deconvolution, and data logging at 85 ms capture rates for the full 1-145 amu measurement range or 125 ms for 1-300 amu.
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Product
Residual Gas Analyzers
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Residual Gas Analyzers are an effective tool to analyze system gas loads resulting from real leaks, virtual leaks or chamber wall outgassing. RGAs have a number of advantages over traditional, dedicated gas leak detectors including the ability to differentiate between different gas species, comparable sensitivity levels, the ability to detect internal or "virtual" leaks and to detect and analyze outgassing problems.
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Product
Remote Plasma Sources
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Semiconductor and Electronic Thin Film applications use plasma sources to generate low-energy ions and radicals to react with material surfaces and chamber walls to remove contaminants and act as a precursor to aid in material deposition. MKS provides multiple options for radical generation including Toroidal and Microwave based Remote Plasma Sources supporting Fluorine, NF3, oxygen, nitrogen and hydrogen process chemistries.
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Product
High Flow Mass Flow Controllers
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High flow thermal mass flow controllers and meters offer both elastomer and metal seals for flow rates up to 300 slm. Versions are available for standard and harsh environments where protection from water and dust is required.
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Product
High Performance Mass Flow Controllers
P-Series
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P-Series High Performance Multi-gas, Multi-range, Thermal Mass Flow Controllers are designed for the most critical process applications where accuracy, repeatability as well as pressure insensitivity are requirements.
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Product
R*evolution® Remote Plasma Source
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The innovative R*evolution® Remote Plasma Source combines field-proven, low-field toroidal plasma technology with an actively cooled plasma chamber made of high purity quartz, significantly reducing oxygen, hydrogen and nitrogen atomic gas loss through wall recombination. Self-contained and compact, R*evolution delivers up to 10 slm of oxygen radicals from a 6kW power supply with true power accuracy of <1% resulting in a high density, extremely clean radical source for photoresist strip and an optimal clean rate greater than 12 microns/min-1. R*evolution can be used for other surface preparation applications.
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Product
Compact Ultrafast 50-50,000 sccm Mass Flow Controller/Meter
C-Series
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The C-Series Mass Flow Controller (MFC) is a compact, fast-response model using a Micro-Electro-Mechanical Systems (MEMS) based flow sensor for non-corrosive gas applications. It is available in Full Scale flow rates from 50 sccm to 50 slm (N2 equivalent) with a control range from as low as 0.1% of Full Scale up to 100% of Full Scale and is also available as a flow meter. Analog (0 to 5 VDC) or digital (RS485 or Modbus TCP/IP) communications interfaces are available. Required power supply voltage is 24 VDC nominal.
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Product
High Accuracy In-Situ Mass Flow Verifier
HA-MFV
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The HA-MFV, High Accuracy Mass Flow Verifier is designed for use on process tools to verify mass flow control flow rates in-situ. Available with EtherCAT® or DeviceNet™ communications and measurement accuracy of 1.0% of reading, the HA-MFV can verify MFC flow with the actual process gas significantly better than older rate-of-rise devices or process chamber rate-of rise methods.
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Product
RF Power Generators
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MKS RF Power Generators provide reliable solid state power for thin films processing equipment. They are vital components of semiconductor fabrication systems, which produce the integrated circuits (ICs) or chips required by modern computers and electronic equipment. MKS RF Generators, combined with our Impedance Matching Network and our V/I Probe form a complete RF Delivery System.
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Product
Mass Flow Controllers
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Enabling Productivity Through Flow Control Innovation. Our wide range of mass flow controllers are available in thermal and pressure based sensor technologies, analog and digital communication, and metal or elastomer seals.
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Product
Industrial Pressure Transducers
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These industrial Baratron® capacitance manometers feature industrial enclosures and higher operating temperature ranges for industrial pressure measurement applications.
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Product
SmartPower® Microwave Power Generators
AX2500
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SmartPower® AX2500 Series intelligent microwave power generators build on ASTeX's experience in producing rugged, reliable microwave power generators for demanding semiconductor fabrication and industrial applications. The AX2500 design architecture incorporates the best of ASTeX field-proven technology, and combines new design features aimed at improved performance and lower cost of ownership.
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Product
Vacuum Process And Chamber Environment Monitors
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Our process monitors are innovative in-situ process monitoring instruments that are fully integrated, application-specific packages, including component residual gas analyzers (RGAs), analytical equipment, and control software. Process mass spectrometers are used in varied applications, including; Semiconductor, Thin Film (CVD, Etch, PVD and degas), pharmaceutical lyophylization and bulk gas purity monitoring.


















