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Plasma
An ionized gas used for flat panel displays.
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One Port Vector Network Analyser
TE3001
The TE3001 One Port Vector Network Analyser is built for the professional who understands the calibration process and has a network analysis task to perform. The unit features a larger output signal than the TE3000 for better noise immunity, and is supplied with a 6 piece custom calibration kit to remove the effect of test fixtures and cables. Together, these features make the TE3001 ideal for broadcast and plasma applications that require a length of cable for connection and may be high in noise or interference.
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Nexis GC-2030 BIDUFRGA
UFRGA Series
The Ultrafast RGA system utilizes the new Barrier Discharge Ionization Detector (BID) technology coupled with Nexis GC-2030 to create new system GC for ultrafast, high-sensitivity analysis. Since the electrode creating Helium plasma is totally isolated from the carrier gas, there is no chance to contaminate this electrode with a dirty sample. This enables long-term stability.
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Digital Dairy Refractometer, Colostrum and Blood Plasma Protein
DD-2
The DD-2 Digital-Dairy Refractometer will provide reliable estimates of the percent solids in waste milk and colostrum quality using the Brix Method, and a blood serum total protein concentration scale can be used to assess failure of passive transfer. The MISCO Digital-Dairy™ refractometers are specifically designed to help professional dairy farmers and calf ranchers to rear healthy calves. They are rugged enough to withstand the demands of farm use, yet precise enough to give laboratory-quality readings.
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R*evolution® Remote Plasma Source
The innovative R*evolution® Remote Plasma Source combines field-proven, low-field toroidal plasma technology with an actively cooled plasma chamber made of high purity quartz, significantly reducing oxygen, hydrogen and nitrogen atomic gas loss through wall recombination. Self-contained and compact, R*evolution delivers up to 10 slm of oxygen radicals from a 6kW power supply with true power accuracy of <1% resulting in a high density, extremely clean radical source for photoresist strip and an optimal clean rate greater than 12 microns/min-1. R*evolution can be used for other surface preparation applications.
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Inductively Coupled Plasma Mass Spectrometry / ICP-MS Systems
Agilent ICP-MS systems utilize innovative technology to deliver excellent sensitivity, accuracy, ease of use and productivity. Our 7800 and 7900 quadrupole ICP-MS systems offer the highest matrix tolerance, widest dynamic range and most effective interference removal for trace elements across most typical applications. The 8900 Triple Quadrupole ICP-MS (ICP-QQQ) adds MS/MS operation, providing precise control of reaction cell processes to ensure the most consistent and accurate results, resolving interferences that are beyond the capability of quadrupole and sector-field high resolution ICP-MS.
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Inductively Coupled Plasma Optical Emission Spectr
An analytical technique used to determine how much of certain elements are in a sample.
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Accessories for Trace Impurity, Plasma Detection and Online Trace Impurity Detectors
Our accessories are tailored to optimise and retain gas purity at every step of the gas sample stage in order to ensure the best performance for trace impurity measurements at the ppb level.
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Pull Off Adhesion Tester
106
Applications for the Elcometer 106 Adhesion Test include paint or plasma spray on bridge decking, coatings on steel, aluminium, concrete etc.Supplied in a carry case - ideal for site testsHand operated - no need for a power supplyIncludes a cutter for EN13144 and ISO 4624 tests
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Monitor Holder for 19" Rack Installation
ZZ-0017-01
- Monitor holder for 19 “rack installation- 9 U (400 mm)- Can be used universally with LED, LCD and plasma monitors- Compatible with the VESA standards 75 x 75 and 100 x 100 mm- Record in portrait and landscape format
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Deep Ultraviolet Spectrophotometer System
VUVAS-10X
A new ultraviolet spectrophotometer system for optical metrology just arrived at NASA Goddard! The VUVAS-10X spectrophotometer works best in the 90 to 160 nanometer wavelength range, also known as deep or vacuum ultraviolet (VUV) region. It uses a windowless hydrogen plasma light source and differential pump section to reach many wavelengths beyond those of conventional deuterium lamps. The source also works with other gases, or gas mixtures, for atomic spectral line emission from about 30 nanometers (double ionized Helium gas) up to the Visible light range. The new spectrophotometer system, McPherson VUVAS-10X, uses a one-meter focal length high-resolution monochromator with the special light source, scintillated detector and Model 121 goniometric sample chamber. The system is ideal for optical transmission, absorbance and specular reflectance at incident angles up to 60 degrees. This McPherson spectrophotometer system will help develop, inspect and qualify optical materials and coatings used for very high altitude and extraterrestrial space flight missions.
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High Power Microwave Plasma Source
The High Power Microwave Plasma Source can be combined with a 6kW microwave generator for a high concentration of radicals providing a high productivity manufacturing solution. The High Power Microwave Plasma source is capable of igniting in multiple process gases, over a wide operating range with performance benefits in current and emerging applications such as, high throughput photoresist removal, advanced surface cleaning and conditioning, as well as, advanced deposition applications at the atomic level.
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In Situ Diagnostics
For researchers working on ultra thin films and novel interfaces, Neocera offers insitu, real-time process control and diagnostic tools such as high-pressure RHEED, Low Angle X-ray Spectroscopy (LAXS) and Ion Energy Spectroscopy (IES). RHEED provides exceptional growth control via RHEED intensity oscillations and the Structural data via diffraction. LAXS is a complimentary to RHEED and provides real-time Compositional information. IES provides energetics of the laser generated plasma plume which is directly responsible for obtaining high quality films and interfaces.
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Ideal Remote Plasma Source For Oxygen-Based Processes
Rapid OX
Reduce recombination effects and extend the lifetime of oxygen radicals thanks to Rapid OX's removable quartz liner. When compared to anodized chambers, the resultant reactive species extended lifetime improves photoresist strip rates. And because the quartz liner is easily installed or removed by the operator, it decreases downtime and significantly lowers replacement costs.
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Inductively Coupled Plasma Emission Spectroscopy
Inductively Coupled Plasma Emission Spectroscopy
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GHW Series 13.56 MHz, 1.25, 2.5, And 5.0 KW High-Reliability RF Plasma Generators
The GHW Series RF power generators deliver maximum rated output powers of 1250, 2500 and 5000 Watts at a frequency of 13.56 MHz. The GHW generators offer field-proven reliability, exceptional stability, and unsurpassed repeatability for high uptime and process yield. They are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.
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Remote Plasma Sources
Equip your manufacturing and abatement processes with high functionality and exceptional reliability. Customize your chemistry. Expand your operating range. Deliver higher process rates. Advanced Energy’s remote plasma sources offer sophisticated options in streamlined designs.
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Plasma Emission Controller
RU-1000
The optical technology developed by HORIBA and the gas control technology offered by HORIBA STEC have been combined to make further advances in plasma control technology. The plasma emission controller RU-100 offers; faster deposition by controlling the transition region, optimized distribution in a large-area, high-capacity chamber, plasma stabilization in a long sputtering process (stable deposition), and mixture optimization of compounds for reactive sputtering.
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Matching Network Solution
Navio
Experience simplicity and high reliability in a single, affordable package. The Navio™ matching network leverages our power expertise to precisely match complex plasma impedance to your tuning range. It’s quick, accurate, and repeatable. Available in multiple power ranges and frequencies, choose from a standard offering or a configurable design. Installation is virtually plug-and-play with Advanced Energy’s RF power supplies. Virtual Front Panel software is available for monitoring.
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Sub-systems
Our self-contained, in-house components design and fabrication capacities ensure the breadth of sub-assemblies offered from rapid prototyping and proof of concept to full production. Ducommun has produced many high performance millimeterwave band sub-assemblies for commercial and military system applications. Among them, the K and Ka band directional Doppler Radar front ends are in production. Several hundreds of sets have been delivered. In addition, Ducommun has delivered Ka through W band engineering prototypes for plasma detection system, automotive Radar, speed Radar, automatic test set, radio telescope, missile terminal guidance, telecommunication system etc. applications.
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Remote Plasma Sources For Process Applications
MKS remote plasma sources deliver high density reactive radicals improving on-wafer cleaning and deposition throughput. Solutions consist of a fully integrated, self-contained unit designed for quick on-chamber installation providing fast, reliable plasma ignition of O2, Hydrogen and Nitrogen gases in a customer configurable package. All solutions are equipped with intelligent power control and EtherCAT® diagnostics supporting Industry 4.0.
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ICP-OES Analyzer
ARCOS
SPECTRO Analytical Instruments GmbH
For the most demanding elemental analyses in industry and research. ARCOS analyzer represents a new pinnacle of productivity and performance for inductively coupled plasma optical emission spectrometers. SPECTRO ARCOS excels in industrial and academic applications for the most advanced elemental analysis of metals, chemicals, petrochemicals, and other materials.
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Transformers
RR Enterprises provides all type of transformersSingle Phase and Three Phase upto 100 KVA.The transformers can be→ Air Cooled→ Epoxy Cast→ Oil CooledWe provide transformers in high voltage and low voltage. These are used for various industrial and research purposes.→ High voltage transformers for corona and static elimination.→ High voltage transformers for plasma welding.→ Special purpose high voltage transformers.→ High current transformers for metalissing plants.→ Special purpose high current transformers.
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Paragon® 8.0 Slm NF3 Flow Intelligent Remote Plasma Source
For cleaning CVD and ALD/ALE process chambers, the Paragon remote plasma source is designed for high gas dissociation rates (> 98%) of NF3 with gas flows up to 8 slm and pressures up to 10 Torr. This leading-edge performance translates into increased process throughput and repeatable process results. The Paragon design incorporates a proprietary plasma block design with a Plasma Electrolytic Oxidation coating for low particle, long block life that delivers lower cost of ownership.
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Remote Plasma Source
MAXstream
Advanced Energy’s MAXstreamTM line is the next generation of remote plasma sources for chamber cleaning. The MAXstream is available in 3, 6, 8, 10, and 12 SLPM NF3 flow rates to optimize price and performance.
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Plasma Process Monitors
Plasma process monitors to monitor plasma emissions during semiconductor manufacturing processes such as etching, sputtering and CVD.
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Thin Films, Plasma and Surface Engineering
A residual gas analyser for vacuum process analysis. Measures the vacuum process gas composition, contamination and leak detection.
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Chemical Analysis and Corrosion Testing
Performing chemical analysis of metal alloys including both ferrous and non-ferrous alloys.Chemical analysis involves determining the chemical constituents of metals and related materials.An industry leader and co-operating laboratory for qualifying Calibration Standards for Chemical Analysis.Our chemical laboratory processes include Spectroscopy – Optical Emission Inductively Coupled Plasma, gas analysers, wet chemical, Intercrystalline/ Intergranular Corrosion (including G28, G48 etc).
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Empowering Traditional Mass Spec
ZipChip
The ZipChip™ separations platform uses integrated microfluidic technology to prepare, separate and electrospray biological samples directly into traditional mass spectrometers (MS). In less than 3 minutes per sample, the cost-effective ZipChip system enables analysis of a broad range of matrices from growth media to cell lysates, blood, plasma, urine, and biopharma products. Each chip provides answers on analytes from small molecules up to intact proteins, antibodies and antibody drug conjugates (ADCs). This platform provides better separation quality than most liquid chromatography (LC) instruments – in a fraction of the time – all with full MS identification behind every separations peak.
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Plasma Emission Detectors for Gas Chromatographs
Our patented Plasma Emission Detector is available for integration into any gas chromatography system or installation. It has been designed for ‘plug and play’ installation and to allow for analysis of impurities from PPB to % levels using either capillary or packed columns.
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Plasma Processing Systems
PlasmaSTAR
The PlasmaSTAR® Series of Plasma Processing Systems from Axic, Inc. defines a new concept in barrel plasma processing. The systems are based on a modular design concept. Starting with a universal base unit, multiple electrode modules are available for easy insertion into the base unit. You will find the ease of use, variety of plasma processes, serviceability and attractive pricing unsurpassed by any other plasma.
