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Inductively Coupled Plasma
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Inductively Coupled Plasma Optical Emission Spectr
An analytical technique used to determine how much of certain elements are in a sample.
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Inductively Coupled Plasma Mass Spectrometry / ICP-MS Systems
Agilent ICP-MS systems utilize innovative technology to deliver excellent sensitivity, accuracy, ease of use and productivity. Our 7800 and 7900 quadrupole ICP-MS systems offer the highest matrix tolerance, widest dynamic range and most effective interference removal for trace elements across most typical applications. The 8900 Triple Quadrupole ICP-MS (ICP-QQQ) adds MS/MS operation, providing precise control of reaction cell processes to ensure the most consistent and accurate results, resolving interferences that are beyond the capability of quadrupole and sector-field high resolution ICP-MS.
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Inductively Coupled Plasma Emission Spectroscopy
Inductively Coupled Plasma Emission Spectroscopy
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Inductively Coupled Plasma Spectrometry
Is an analytical technique that can be used to measure elements at trace levels in biological fluids.
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Inductively Coupled Plasma Mass Spectrometer
ICPMS-2030
With its newly developed collision cell and optimized internal structure, the ICPMS-2030 provides superior sensitivity. At the same time, thanks to the adoption of its proprietary mini-torch unit and provision of an Eco mode, the quantity of argon gas needed for analyses has been greatly reduced to the industry's lowest levels. As a result, low running costs are assured. The Development Assistant function of the software automatically sets the optimal analysis conditions for quantitative analysis. Then, after measurements are complete, the Diagnosis Assistant function automatically checks the validity of the necessary data. While reducing the burden on the user, the efficiency of analyses is enhanced and the reliability of the data can be increased. It complies with FDA 21 CFR Part 11.
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Inductively Coupled Plasma Spectroscopy (ICP-OES/MS), ICP Analysis Services
ICP-OES measures the light emitted at element-specific characteristic wavelengths from thermally excited analyte ions . This light emitted is separated and measured in a spectrometer, yielding an intensity measurement that can be converted to an elemental concentration by comparison with calibration standards. ICP-MS (ICP-Mass Spec) measures the masses of the element ions generated by the high temperature argon plasma. The ions created in the plasma are separated by their mass to charge ratios, enabling the identifcation and quantitation of unknown materials. ICP-MS offers extremely high sensitivity (i.e. low detection limits) for a wide range of elements
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Chemical Analysis and Corrosion Testing
Performing chemical analysis of metal alloys including both ferrous and non-ferrous alloys.Chemical analysis involves determining the chemical constituents of metals and related materials.An industry leader and co-operating laboratory for qualifying Calibration Standards for Chemical Analysis.Our chemical laboratory processes include Spectroscopy – Optical Emission Inductively Coupled Plasma, gas analysers, wet chemical, Intercrystalline/ Intergranular Corrosion (including G28, G48 etc).
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Inductively Coupled Plasma
Inductively Coupled Plasma Techniques can be very powerful tools for detecting and analyzing trace and ultra-trace elements. Over the past years, ICP-MS has become the technique of choice in many analytical laboratories for providing the accurate and precise measurements needed for today’s demanding applications and for providing required lower limits of detection.
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Inductively Coupled Plasma Mass Spectrometer
An analytical technique that can be used to measure elements at trace levels in biological fluids.
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Inductively Coupled Plasma Optical Emission Spectroscopy / ICP-OES Systems
Industry-leading performance, speed and ease of use – no compromises
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ICP Plasma System
The AXIC IsoLok® Inductively Coupled Plasma (ICP) Load-Locked Processing System from AXIC, Inc. defines a new concept in Deep Reactive Ion Etch (DRIE) and low temperature-low damage Plasma Enhanced Chemical Vapor Deposition (ICP-PECVD) plasma processing. The system is based on a modular design starting with a universal chamber and cabinet unit with ICP etch or deposition bottom electrodes available for easy installation into the chamber unit combined with a load-lock. We are confident you will find the ease of use, variety of plasma processes, serviceability and attractive pricing unsurpassed by any other plasma product in the market.
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Inductive Sensors
In general, inductive proximity switches consist of four basic elements: a coil, an oscillator, a threshold switch and an output stage with short-circuit protection.The oscillator generates a high frequency, electromagnetic alternating field which is emitted from the active face of the coil.Eddy currents are induced in a metal object that enters this field. These eddy currents draw energy from both the electromagnetic field and from the oscillator which is consequently attenuated.The more energy taken the closer the metal object moves towards the active face. The threshold switch switches on the output stage at a defined attenuation value.In proximity switches with a DC voltage supply, this switch is designed as an NPN transistor which switches the connected load to the negative pole or as a PNP transistor which switches the load to the positive pole. The output stage is a thyristor or a triac in AC voltage switches.
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Coupled Cavity TWTs
Communications & Power Industries
• Frequencies from 2.7 to 37.5 GHz• Peak levels: 500 W to 180 kW• Cooling type: air, liquid, conduction• Depressed or grounded collectors• CW (Continuous Wave) and Pulsed
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Inductive Sensors
*Wide operating temperature range*High protection rating for the requirements of harsh industrial environments*Reliable detection due to low sensor tolerances*Reduced inventory due to wide range of applications
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Inductive sensors
Inductive sensors are signal generators which detect function-related movements of processing machines, robots, production lines, conveyor systems etc. in a contactless fashion, and transform them into electrical signals.
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Inductive Motor Control
The inductive motor control position sensor family detects the electrical position within one pole-pair of a rotating shaft and can be used for the motor commutation of a brush-less DC (BLDC) motor. Based on the inductive sensor technology, this family measures the coupling between an excitation coil (TX) and two receiver coils (RX) via a rotating target. The coils are executed as printed circuit coils and the rotating target is a simple punched metal part. With the correct layout of the coils and the target, both synchronized to the number of pole-pair count of the motor, the IC output is proportional to the electrical angular position within one pole-pair segment with increased resolution and high performance of only 0.3° electrical INL!
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Unclamped Inductive Load Tester
ITC75100
The ITC75100 is an enhanced unclamped inductive load (UIL) test system that builds on the success of ITC’s industry leading ITC55 series of testers by adding additional test and measurement capability.
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Namur Inductive Proximity Sensor
Shanghai Pubang Sensor Co.,Ltd.
1. NAMUR SENSOR, super low leakage current design2. Eliminate the security risks3. Suitable for inflammable and explosive dangerous areas
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Inductively Powered Telemetry Systems
Advanced Telemetrics International
ATi Inductively Powered Telemetry Systems are typically used to transmit data from rotating shafts or machinery to a stationary receiver.
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Fail-Safe Inductive Sensors
*Certification to EN 60947-5-3 for electromechanical controlgear*Ensuring operator and machine safety*No special actuator for electronic fail-safe sensors required*Connection to safety plc or safe AS-i module*Series connection of sensors and contacts possible
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Inductive Sensors (LVDT)
induSENSOR
Micro-Epsilon offers a large range of inductive sensors for displacement and position measurement from conventional LVDT sensors and inductive sensors with integrated controller to customer-specific high-volume versions. The induSENSOR displacement sensors from Micro-Epsilon are used in automated processes, quality assurance, test rigs, hydraulics, pneumatic cylinders and automotive engineering.
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Remote Plasma Sources
Equip your manufacturing and abatement processes with high functionality and exceptional reliability. Customize your chemistry. Expand your operating range. Deliver higher process rates. Advanced Energy’s remote plasma sources offer sophisticated options in streamlined designs.
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Plasma Emission Controller
RU-1000
The optical technology developed by HORIBA and the gas control technology offered by HORIBA STEC have been combined to make further advances in plasma control technology. The plasma emission controller RU-100 offers; faster deposition by controlling the transition region, optimized distribution in a large-area, high-capacity chamber, plasma stabilization in a long sputtering process (stable deposition), and mixture optimization of compounds for reactive sputtering.
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Time-domain Field-Device-Circuit coupled simulator
EM-SUPREME®
Time-domain Field-Device-Circuit coupled simulator for modeling of passive structures, active components, and complete RF & millimeter-wave modules. EM-Supreme is used for EM modeling of power amplifiers, switches, filters, active antennas, and complete RF modules such as antenna-switch, switch-filter, switch-filter-amplifier, and front-end modules with no approximations.
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R*evolution® Remote Plasma Source
The innovative R*evolution® Remote Plasma Source combines field-proven, low-field toroidal plasma technology with an actively cooled plasma chamber made of high purity quartz, significantly reducing oxygen, hydrogen and nitrogen atomic gas loss through wall recombination. Self-contained and compact, R*evolution delivers up to 10 slm of oxygen radicals from a 6kW power supply with true power accuracy of <1% resulting in a high density, extremely clean radical source for photoresist strip and an optimal clean rate greater than 12 microns/min-1. R*evolution can be used for other surface preparation applications.
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Remote Plasma Source
MAXstream
Advanced Energy’s MAXstreamTM line is the next generation of remote plasma sources for chamber cleaning. The MAXstream is available in 3, 6, 8, 10, and 12 SLPM NF3 flow rates to optimize price and performance.
