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Detectors
Solar blind detector for operation in the 1 to 180 nanometer region. It is encased in a vacuum tight housing for vacuum operation. The Model 425 is ideal for measurements in the Extreme and Vacuum UV (EUV and VUV) where the solar blind feature eliminates potential interference from long wavelength ultraviolet and visible light. It may be operated in pulse-counting mode or DC. The CEM is also available with coatings like Cesium Iodide or Magnesium Fluoride to enhance response in different energy regions.
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Semiconductor
Aerotech has a long history of engineering and manufacturing motion systems and components for high precision wafer processing, scanning electron microscopy (SEM), wafer bumping, 450 mm wafer manufacturing, lithography equipment and advanced laser micromachining. We also specialize in systems and components for vacuum applications, such as EUV lithography. So whether you need off-the-shelf wafer bumping components or a custom-engineered SEM system manufactured and tested to exacting specifications, Aerotech can provide the optimal solution for your application.
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Gratings for Synchrotron, FEL and EUV Light Sources
HORIBA Scientific holographic lamellar gratings exhibit ultra-low grooves roughness and unique efficiency uniformity making them ideal for Synchrotron, Free Electron Laser (FEL), EUV or Soft X-ray light sources.
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Dry Systems
Chips are made up of many layers stacked on top of one another, and it’s not necessarily the latest and greatest immersion lithography machines that are used to produce these layers. In a given chip, there may be one or two more complicated layers that are made using an EUV lithography machine, but the rest can often be printed using ‘older’ technology such as dry lithography systems. This is certainly more cost-effective for customers, since these older machines are less expensive to purchase and maintain. Read about how dry lithography systems are enabling progress.
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Immersion Systems
Immersion systems are the workhorses of the industry. Our latest NXT machines have shown the ability to run in excess of 6,000 wafers per day, with an average five percent productivity increase over 12 months, supporting our customers' value requirements. We continue to innovate our immersion systems to meet the requirements of future nodes, benefiting from commonalities in R&D with our EUV program, while ensuring the platform’s extendibility through System Node Enhancement Package upgrades. Thanks to these packages, any NXT system can be upgraded to the latest technology.
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EUV Lithography Systems
Using extreme ultraviolet (EUV) light, our NXE and EXE systems deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible
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EUV Lithography
EXE systems
EXE, or ‘High NA’, systems are the latest generation in EUV lithography. With a numerical aperture (NA) of 0.55, their innovative new optics provide higher contrast and print with a resolution of just 8 nm.
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EUV Lithography
NXE systems
NXE lithography systems are used in high-volume manufacturing of advanced Logic and Memory chips. The first systems to use ASML’s novel 13.5 nm EUV light source, they print microchip features with a resolution of 13 nm, which is unreachable with deep ultraviolet (DUV) lithography. Chipmakers use our NXE systems to print the highly complex foundation layers of their 7 nm, 5 nm and 3 nm nodes. Read about how EUV lithography went from imagination to reality.
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Patterning Simulation
KLA’s patterning simulation systems use advanced models to explore critical-feature designs, manufacturability and process-limited yield of proposed lithography and patterning technologies. Our patterning simulation software allows researchers to evaluate advanced patterning technologies, such as EUV lithography and multiple patterning techniques, without the time and expense of printing hundreds of test wafers using experimental materials and prototype process equipment.
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Scanning Electron Microscope
E5620
The E5620 is a MASK DR-SEM(∗) product for reviewing and classifying ultra-small defects in photomasks and mask blanks. It implements Advantest’s highly stable image capture technology to easily import defect location data from mask inspection systems and automatically image the locations. Compared to the E5610, our predecessor DR-SEM system, the E5620 features a number of improvements designed specifically to target mask requirements for extreme ultraviolet (EUV) lithography.
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wavefront sensors
HASO EUV
Imagine Optic's HASO EUV wavefront sensor, developed in conjunction with LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today's demanding laboratory and industrial applications.
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Electrodeless Z-Pinch™10 Watt EUV Source
EQ-10
The EQ-10 is a compact, easy-to-use, reliable, and cost-effective EUV light source, based on Energetiq's proven Electrodeless Z-pinch™ technology using Xenon gas. The EQ-10 EUV source is uniquely suited for metrology and research applications.
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PCE-2000UV_1.5 Ultraviolet Light Radiation Measurement System
Hangzhou Everfine Photo-E-Info Co., LTD
PCE-2000UV UV light source radiation Measurement system can realize the measurement of the relative spectral power distribution of ultraviolet LED, UV fluorescent lamp, UV light source, peak wavelength, half-peak wavelength, spectral radiation flux of UV-A/B/C, and the total radiation flux in specific wavelength.
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Ultraviolet Analyzers
Teledyne Analytical Instruments
Ultraviolet Analyzers by Teledyne Analytical Instruments
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Ultraviolet Light Distribution Measurement Film
UVSCALE
UVSCALE is a film that responds to UV light, and changes color depending on the amount of light it is exposed. This makes it easy to see UV light distribution. There are a roll type and a sheet type, with three types for different amounts of light.
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Deep Ultraviolet Observation System for Microscope
U-UVF248
Model Capable of High-magnification/High-contrast Deep Ultraviolet (DUV) Observation. A Semiconductor / FPD Inspection Microscopes.
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Extreme Temperature Passive Probe
N7007A
Many environmental test engineers today are using standard-temperature probes in extreme temperature condition, which causes physical damage to the probe. Another common practice among environmental test engineers is to simply attach long wires at the end of their probes, which significantly degrades measurement performance due to excessive inductance and reduced bandwidth. Keysight addresses this issue with the N7007A single-end passive probe.
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Deep Ultraviolet Spectrophotometer System
VUVAS-10X
A new ultraviolet spectrophotometer system for optical metrology just arrived at NASA Goddard! The VUVAS-10X spectrophotometer works best in the 90 to 160 nanometer wavelength range, also known as deep or vacuum ultraviolet (VUV) region. It uses a windowless hydrogen plasma light source and differential pump section to reach many wavelengths beyond those of conventional deuterium lamps. The source also works with other gases, or gas mixtures, for atomic spectral line emission from about 30 nanometers (double ionized Helium gas) up to the Visible light range. The new spectrophotometer system, McPherson VUVAS-10X, uses a one-meter focal length high-resolution monochromator with the special light source, scintillated detector and Model 121 goniometric sample chamber. The system is ideal for optical transmission, absorbance and specular reflectance at incident angles up to 60 degrees. This McPherson spectrophotometer system will help develop, inspect and qualify optical materials and coatings used for very high altitude and extraterrestrial space flight missions.
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Extreme Environment Sensors
For high pressure, low temperature, and high temperature applications* For applications requiring high accuracy, high reliability, and structural integrity.* Operating temperatures from -320°F to +1000°F (+1200°F short term).* Displacement systems withstand pressures up to 3500 or 5000 psi.* Dual-coil sensor design effectively minimizes radiation effects.* Hermetically sealed and laser welded.* Unaffected by environmental contaminants.
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Light Meter
LI-250A
The LI-250A is a portable meter that displays the output from any LI-COR light sensor that has a cable terminated with a BNC connector. It shows instantaneous values or 15-second averages of values from a sensor.
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Light Curtains
Leuze electronic GmbH + Co. KG
Switching light curtains are perfect for monitoring large measurement fields. They react as soon as anything or anyone penetrates this field. Their fast configuration and simple handling save time and money compared to imaging processes. Thanks to different beam spacings and measurement field lengths, switching light curtains can be used to solve a range of application problems.
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Light Source
pE-300white
CoolLED's pE-300white offers intense, broad-spectrum LED illumination for imaging most common fluorescent stains. The pE-300white Light Source can be fitted directly to the microscope or specified with a liquid light guide. The system is a mercury-free alternative that is safer, more controllable, and repeatable than conventional high-pressure gas discharge illuminators. Spectral coverage is from the UV (DAPI excitation) to the Red region (Cy5 excitation). The system is perfect for hospital and regular research laboratory environments.
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Light Meter
PLMT56
Light Meter Measures In LuxOver-Range IndicatorLong-Life Silicon Photo Diode InsideMeasurement Rate: 1.5 Times per SecondMax Range: 50,000 LuxAccuracy: +/- 5% Under 10000 Lux, +/- 10% Over 10000 LuxMax Resolution: 0.1 LuxDimensions: 7.40' H x 2.52' W x 0.96' DAccessories Included: 12V A23 Battery, Photo DetectorSold as : Unit
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Light Simulator
From the review of the scientific development history, reliable and stable artificial light sources have played a very important role in the past century. For example, the artificial solar simulator is an important part of simulating sunlight to ensure accurate performance of PV characterization. With the growth of light sensor applications, more and more requirement of light simulators (or artificial light sources) explored. One of the core technologies of Enlitech is the artificial light sources. We can manipulate different lamp types (short arc lamps, LEDs, filament lamps et. al.) to generate different spectrum-form in different light intensity levels, beam sizes, and wavelength ranges. We have launched different artificial light source products for different applications fields. For instance, SS-X series solar simulators and ILS-30 ambient light simulator are for the PV field, HAAS is highly accurate star light simulator for the space field, and ALS-300 is a general-purpose light source in science research field. These products can not only meet the needs of your application, but also speed up the process of your research or mass-production.
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GO-SPEX200 Ultraviolet Space Radiation Distribution Measurement System
Hangzhou Everfine Photo-E-Info Co., LTD
GO-SPEX200 adopts the special darkroom-integrated design, integratesl electric, radiation, temperature controller, it specialized for UV LED package (including integrated packaging) of the total radiation flux, spatial distribution of radiation intensity (light distribution performance), radiation intensity data, angle, total radiation flux accurate testing, comply with relevant standards.
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Extreme Performance Edge Servers
Ark-7000 Series
ARK-7000 series feature Intel Xeon processors and multiple expansion slots, delivering high-speed data transfer rates and enhanced remote management.
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Light Microscopes
Compound light microscopes from Leica Microsystems meet the highest demands whatever the application – from routine laboratory work to the research of multi-dimensional dynamic processes in living cells.
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Light Source
UVF-204S
This is the ultra compact and light weight high power unit fully utilizing characteristics of the high stability and long life 200watt mercury xenon lamp.
