Plasma
An ionized gas used for flat panel displays.
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Spectrometers, Vacuum
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A compact and versatile vacuum ultraviolet monochromator. A selection of aberration-corrected diffraction gratings is available so you can tailor the instrument to your wavelength of interest and application. Connect this instrument directly to your vacuum plasma physics experiment or build an intense UV tunable source. It is available as a scanning monochromator, as a spectrometer, or as a spectrograph with microchannel plate or direct-detection CCD. The Model 234/302 is popular in systems due to its compact design, high throughput and resolution. It is also available with an additional entrance or exit port.
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Real Time MM-Wave Frequency Analyzers up to 180 GHz
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When millimeter-wave applications came into many domains of human activity, a need for precise measurements of signal frequency spectrum has become critical. This need is quite understandable when, for example, it concerns to exploring extraterrestrial radio-sources or micro/mm-wave background emission in radio-astronomy, or measuring chemical composition of the atmosphere through the molecular emission of different its components, plasma diagnostics or many military applications.
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UV Plasma Sources
UVS300|UVS 10/35
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The UVS300 and UVS 10/35 are UV Plasma sources with high intensity, working with different gases.
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Enable Non-Invasive Analysis
Sparklike Handheld™
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Sparklike Handheld™ is practical and quick method to test IG gas concentration. Technology is based on plasma emission spectroscopy. A high voltage spark is launched in the IG unit's cavity causing a light emission which is observed and analyzed further.
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In Situ Diagnostics
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For researchers working on ultra thin films and novel interfaces, Neocera offers insitu, real-time process control and diagnostic tools such as high-pressure RHEED, Low Angle X-ray Spectroscopy (LAXS) and Ion Energy Spectroscopy (IES). RHEED provides exceptional growth control via RHEED intensity oscillations and the Structural data via diffraction. LAXS is a complimentary to RHEED and provides real-time Compositional information. IES provides energetics of the laser generated plasma plume which is directly responsible for obtaining high quality films and interfaces.
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Optical Emission Spectrometry
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Involves applying electrical energy in the form of spark generated between an electrode and a metal sample, whereby the vaporized atoms are brought to a high energy state within a so-called "discharge plasma".
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Product
Long Focal Length Spectrometer
1000M Series
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The M Series II monochromators are the large focal length monochromators of choice for the most demanding spectroscopy applications such as Raman, Plasma Emission, LIBS and others. With a spectral resolution down to 0.006 nm and an optional dual automated entrance and exit ports, the M Series II monochromators are the most versatile spectrometers in their market space. These monochromators also benefit from the highest quality of gratings, also designed and manufactured by HORIBA. The M Series is the ultimate spectrometer for ultra-high spectral resolution down to 0.006 nm.
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Transformers
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RR Enterprises provides all type of transformersSingle Phase and Three Phase upto 100 KVA.The transformers can be→ Air Cooled→ Epoxy Cast→ Oil CooledWe provide transformers in high voltage and low voltage. These are used for various industrial and research purposes.→ High voltage transformers for corona and static elimination.→ High voltage transformers for plasma welding.→ Special purpose high voltage transformers.→ High current transformers for metalissing plants.→ Special purpose high current transformers.
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Product
High Power Microwave Plasma Source
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The High Power Microwave Plasma Source can be combined with a 6kW microwave generator for a high concentration of radicals providing a high productivity manufacturing solution. The High Power Microwave Plasma source is capable of igniting in multiple process gases, over a wide operating range with performance benefits in current and emerging applications such as, high throughput photoresist removal, advanced surface cleaning and conditioning, as well as, advanced deposition applications at the atomic level.
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Plasma-Enhanced Chemical Vapor Deposition (PECVD)
VECTOR Product Family
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Dielectric film deposition processes are used to form some of the most difficult-to-produce insulating layers in a semiconductor device, including those used in the latest transistors and 3D structures. In some applications, these films need to conform tightly around intricate structures. Other applications require dielectric films to be exceptionally smooth and defect free since slight imperfections are multiplied greatly in subsequent layers.
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Remote Plasma Sources
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Equip your manufacturing and abatement processes with high functionality and exceptional reliability. Customize your chemistry. Expand your operating range. Deliver higher process rates. Advanced Energy’s remote plasma sources offer sophisticated options in streamlined designs.
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MHG Solar Simulation
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Atlas Material Testing Solutions
Filtered MHG lighting is a mature technology used since the 80’s for larger solar simulators inside environmental test chambers. MHG lamps are filled with a mixture of mercury, halides and rare earth elements which vaporize during ignition, generating a plasma. After a few minutes, the plasma reaches thermal equilibrium and emits a quasi-continuous spectrum (when properly filtered) similar to global solar radiation.
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Plasma Process Monitors
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Plasma process monitors to monitor plasma emissions during semiconductor manufacturing processes such as etching, sputtering and CVD.
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Inductively Coupled Plasma
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Inductively Coupled Plasma Techniques can be very powerful tools for detecting and analyzing trace and ultra-trace elements. Over the past years, ICP-MS has become the technique of choice in many analytical laboratories for providing the accurate and precise measurements needed for today’s demanding applications and for providing required lower limits of detection.
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Post Dicing
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Camtek offers dedicated inspection and metrology solutions for dicing-related processes, ensuring the reliability of the end product. Camtek developed new capabilities to address new dicing technologies such as Stealth and Plasma dicing using new algorithmic and technologies such as Back Light illumination, as well as various handling solutions.
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Inductively Coupled Plasma Spectrometry
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Is an analytical technique that can be used to measure elements at trace levels in biological fluids.
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Die-To-Wafer Bonding Systems
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Several different D2W bonding methods are available and selected depending upon the application and customer requirements. In direct placement D2W (DP-D2W) bonding, the singulated dies are bonded to the target wafer one by one using a pick-and-place flip-chip bonder. Plasma activation and cleaning of the surfaces of the dies on the handler wafer are essential steps for establishing a high-yielding bond and electrical interface between the dies and target wafer. This is where the EVG320 D2W activation system comes in.
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Streak Camera
OptoScope SC-20 systems
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The SC-20 streak camera system is characterized by its large detection area of 35 mm x 4 mm and a large usable screen diagonal of 40 mm. Signals are mapped onto the fiber optic input window and measured without the need for optical reduction. In the simplest case, the entrance optics consists of a slit mask that lies directly on the entrance window. In addition, a flexible extension with a shutter, a lens mount or an adjustable slot with coupling optics is possible. The time resolution in the sub-nanosecond range qualifies the camera for many applications in detonics and plasma physics.
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OES Spectrometers
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OES Spectrometers (Optical Emission Spectrometers for OEMs) optimized for SEMICON applications including plasma monitoring/end-point detection and reflectometry (with the addition of a flash lamp). The OES-Star features unmatched throughput and SNR, spectral coverage and < 1 nm resolution). Our new OES Family, OES-Star, VS70-MC and InVizU all include our latest “Multi-Communications interface” electronics (MC= EtherCAT, Ethernet, USB-2). The Invizu integrates both a linear CMOS sensor for UV-VIS and a TE-Cooled INGAAS sensor, which extends the spectral coverage to 1700 nm.
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ALD For Research & Development
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Veeco’s atomic layer deposition research systems are designed by ALD scientists and built for maximum experimental flexibility and value. With universal precursor delivery systems, you can use solid, liquid or gas chemistries in any precursor port. There are many options to choose from including ozone generators, in-situ monitoring and various configurations. As always, our team of ALD scientists are ready to answer your recipe development and film characterization questions. Over 2500 published academic papers feature research performed on our Savannah® thermal ALD system and Fiji® plasma ALD system.
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Thin-film deposition
Plasma Source
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SPECS Surface Nano Analysis GmbH
Thin-film deposition covers any technique for depositing material onto a bulk or thin film substrate. Elemental alloy or compound films are produced by non-reactive or reactive (co-)deposition. Often functionalization or tailoring of device interfaces by predeposition or deposition assisting surface treatment with atoms or ions is necessary.
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Principle Of Optical Emission Spectrometry
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Optical emission spectrometry involves applying electrical energy in the form of spark generated between an electrode and a metal sample, whereby the vaporized atoms are brought to a high energy state within a so-called "discharge plasma".
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Standard CW Amplifiers
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The BT-AlphaA-CW series is a range of classAB RF power amplifiers covering the 10kHz to1MHz frequency range. Rugged, solid-state design - high reliability. Extremely high phase and amplitude stability. High linearity. In-Built Protection. Very fast blanking. Capable of pulsed operation. Competitively priced. Suitable for CW radar, communications, HF/VHF jamming, particle accelerator applications/plasma systems, plasma, RF heating and other scientific applications.
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Sub-systems
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Our self-contained, in-house components design and fabrication capacities ensure the breadth of sub-assemblies offered from rapid prototyping and proof of concept to full production. Ducommun has produced many high performance millimeterwave band sub-assemblies for commercial and military system applications. Among them, the K and Ka band directional Doppler Radar front ends are in production. Several hundreds of sets have been delivered. In addition, Ducommun has delivered Ka through W band engineering prototypes for plasma detection system, automotive Radar, speed Radar, automatic test set, radio telescope, missile terminal guidance, telecommunication system etc. applications.
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Ideal Remote Plasma Source For Oxygen-Based Processes
Rapid OX
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Reduce recombination effects and extend the lifetime of oxygen radicals thanks to Rapid OX's removable quartz liner. When compared to anodized chambers, the resultant reactive species extended lifetime improves photoresist strip rates. And because the quartz liner is easily installed or removed by the operator, it decreases downtime and significantly lowers replacement costs.
