Sapphire
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Product
Pressure Sensors
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ESI Technology manufacture a wide range of pressure sensors using a variety of different technologies. Pressure transducers (voltage output), pressure transmitters (milliamp output), panel meters, accessories. Silicon-on-Sapphire technology and a titanium diaphragm combine to make the new Gold Standard in pressure sensing. Custom pressure measurement solutions have been integral to ESI’s success. All aspects of design and manufacture are done in-house at our UK facility. Impressive quality at an affordable price. So if you don’t see what you are looking for, just ask.
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Product
1.3 Million Pixel CMOS Image Sensor
Sapphire 1.3M
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This 1.3 million pixel Sapphire CMOS image sensor, designed on Teledyne e2v’s proprietary Eye-On-Si CMOS imaging technology, is ideal for diverse applications where superior performance is required. The innovative pixel design offers excellent performance in low-light conditions with both electronic rolling shutter and electronic global shutter, with a high-readout speed of 60 fps in full resolution. Novel industrial machine vision application features such as multi ROI and histogram output are embedded on-chip. Very low power consumption enables this device to be used in battery powered applications.
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Product
Femtosecond Terawatt Ti:sapphire Laser System
MPA-XL
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MPA-XL is a cost-effective terawatt Ti: sapphire amplifier system. It gives up to 200 mJ energy of the stretched pulse and further compression with 65% efficiency. A standard air compressor can be placed into a custom designed vacuum chamber.
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Product
Substrate Manufacturing
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KLA’s substrate manufacturing portfolio includes defect inspection and review, metrology and data management systems that help substrate manufacturers manage quality throughout the wafer fabrication process. Specialized wafer inspection and review tools assess wafer surface quality and detect, count and bin defects during production and as a critical part of outgoing wafer qualification. Wafer geometry systems ensure the wafer shape is extremely flat and uniform in thickness, with precisely controlled wafer shape topography. Data analysis and management systems proactively identify substrate fabrication process excursions that can lead to yield loss. KLA’s substrate manufacturing systems support process development, production monitoring and final quality check of a broad range of substrate types and sizes including silicon, prime silicon, SOI, sapphire, glass, GaAs, SiC, GaN, InP, GaSb, Ge, LiTaO3, LiNBO3, and epitaxial wafers.
