Lithography
nano fabrication of circuitry.
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Lithography
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With steppers for advanced packaging and flat panel display technology, Onto Innovation's latest fleet will meet today's manufacturing challenges head on. Systems are designed to maximize throughput without limited resolution and overlay.
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Lithography
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EVG’s key competencies in lithographic technology lie in the high-throughput contact and proximity exposure capabilities of its mask aligners and its newly developed, revolutionary and highly versatile maskless exposure lithography systems. These capabilities are complemented by its resist coating and resist development systems with advanced in-house process competences and hands-on development skills.
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EUV Lithography Systems
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Using extreme ultraviolet (EUV) light, our NXE and EXE systems deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible
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EUV Lithography
EXE systems
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EXE, or ‘High NA’, systems are the latest generation in EUV lithography. With a numerical aperture (NA) of 0.55, their innovative new optics provide higher contrast and print with a resolution of just 8 nm.
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Electron Beam Lithography System
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Spot type Electron Beam Lithography System JBX-8100FS achieved high throughput, small footprint and electric power saving.
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DWL 66⁺ Laser Lithography System
DWL 66⁺
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The DWL 66⁺ Laser Lithography System is a cutting-edge platform that combines advanced grayscale capabilities and the highest resolution available in direct-write laser systems. This machine is expertly designed for research and development in fields such as microelectronics, MEMS, and photonics, providing unparalleled versatility in both direct writing and low-volume mask making. With its minimum feature size of just 200 nm and 65,536 grayscale levels, the DWL 66⁺ surpasses traditional optical lithography solutions, ensuring precise pattern generation for a multitude of applications including sensors, optics, and quantum devices.
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Interference Lithography Gratings
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Interference lithography is an optical nanolithography technology for the fabrication of extensive periodic nanostructures. Critical dimensions of less than 50 nm can be realized. At AMO two interference lithography tools are installed. One setup for extensive, high quality gratings with fixed periods, the other more flexible tool allows quick prototyping. We offer grating fabrication on silicon, silicon dioxide and other substrates with tailored pitch, etch depth and size.
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Integrated Lithography Track Systems
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Lithography track systems complete the EVG lithography product family with a fully integrated production system and high grade of automation combining mask alignment and exposure with integrated pre- and post-processing. Based on a modular platform, the HERCULES lithography track system merges EVG’s established optical mask alignment technology with integrated cleaning, resist coating, baking and resist development modules. This turns the HERCULES platform into a “one stop shop”, where pre-processed wafers are loaded into the tool and fully structured processed wafers are returned.
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Nanoimprint Lithography
NIL
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EVG is the market-leading supplier of nanoimprint lithography (NIL) equipment and integration processes. EVG pioneered and mastered NIL from a research approach more than 15 years ago, to implementation in volume production on various substrate sizes from 2 inch compound semiconductor wafers to 300 mm wafers and even on large-area panels. NIL is the most promising and cost-effective process for generating nanometer-scale-resolution patterns for a variety of commercial applications in bioMEMS, microfluidics, electronics and, most recently, various diffractive optical elements.
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Mask Alignment Systems
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EVG’s inventions, such as the world’s first bottom-side alignment system in 1985, have pioneered and set the industry standards in both top and double-sided lithography, aligned wafer bonding and nanoimprint lithography. EVG contributes in these areas through continuous development of mask aligner product generations to augment this core lithography technology.
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DWL 2000/4000 GS Laser Lithography Systems
DWL 2000 GS / DWL 4000 GS
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The DWL 2000 GS / DWL 4000 GS Laser Lithography systems are state-of-the-art pattern generators renowned for their speed and flexibility. These systems leverage advanced grayscale lithography technology that not only complies with the highest industrial standards but also generates complex 2.5D topographies essential for micro-optical applications.
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Lithography System
JetStep S3500
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The JetStep S3500 panel lithography system is designed specifically for advanced packaging panel production. The system incorporates advanced features that address requirements for panel-level packaging, such as die shift due to placement accuracy or subsequent processing steps, CTE mismatch, panel warpage and panel handling.
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Advanced Node Solution
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A major new challenge at 20nm/14nm is the requirement for extra masks (double patterning technology, or DPT) to make existing lithography work at this advanced node. Read 20 questions on 20nm - a Q&A document.
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Laser Interferometers
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ZYGO laser interferometers support and enable the most demanding metrology applications in industries from semiconductor and lithography to space-borne imaging systems, cutting-edge consumer electronics, defense-related IR and thermal imaging systems and ophthalmics.
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Semiconductor Manufacturing Optics
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No lithography without optics. No semiconductors without lithography. Without semiconductors there would be no microchips, without microchips no computers – no high-tech products. As an OEM (Original Equipment Manufacturer) supplier, ZEISS enables the semiconductor industry worldwide with optics and other optical modules.
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Nanopositioning Systems
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Mad City Labs'' nanopositioning systems move and maintain the position of objects with sub-nanometer precision and high stability. Applications for nanopositioners include super resolution microscopy, high speed confocal imaging, AFM, NSOM, SPM, optical trapping, fiber positioning, single molecule spectroscopy, single molecule/particle tracking, high resolution optical alignment, nanoscopy and lithography.
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Dry Systems
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Chips are made up of many layers stacked on top of one another, and it’s not necessarily the latest and greatest immersion lithography machines that are used to produce these layers. In a given chip, there may be one or two more complicated layers that are made using an EUV lithography machine, but the rest can often be printed using ‘older’ technology such as dry lithography systems. This is certainly more cost-effective for customers, since these older machines are less expensive to purchase and maintain. Read about how dry lithography systems are enabling progress.
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IDA Electrodes
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Interdigitated Array (IDA) electrode is an electrode developed for electrochemical measurements to be performed in a very small quantity of the sample. IDA electrode could be applied for the detection and reaction analysis of the compounds in a small quantity of the sample. IDA electrode is a microelectrode pattern fabricated by using the lithography technology. The Electrodes are composed of 65 pairs. In each one of the pair has a function of the oxidation and reduction electrodes.
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Nanostructuring
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AMO offers a highly flexible process-platform for the fabrication of nanostructures. We have a broad range of lithography techniques that can be flexibly combined with each other – including interference lithography. Each lithography technique is tailored to a specific pattern-transfer process and can be used on a wide range of substrates. In addition, we have developed an advanced nanoimprint lithography process that can transfer e-beam-defined patterns to large areas in a cost-effective manner.
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MLA 300 Maskless Aligner
MLA 300
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The MLA 300 Maskless Aligner is engineered for high-volume production, delivering exceptional flexibility and precision in the realm of industrial lithography. This innovative tool supports wafers up to 300 x 300 mm and is capable of dynamically adjusting to surface variations, effectively eliminating the need for costly and time-consuming mask production. By employing direct data exposure instead of traditional masks, the MLA 300 provides advanced solutions for complex lithography challenges, including those encountered in advanced packaging, sensor calibration, and MEMS fabrication. With its high throughput of up to 18,000 mm²/min and resolution down to 1.5 μm, it streamlines workflows and integrates seamlessly with manufacturing execution systems (MES), making it the preferred choice for a broad range of applications like microfluidic devices and other cutting-edge technologies.
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Product
2-26.5 GHz Traveling Wave Amplifier
1GG7-8045
Amplifier
The 1GG7-8045 is a broadband GaAs MMIC Traveling Wave Amplifier designed for high output power and moderate gain over the full 2 to 26.5 GHz frequency range. Seven MESFET cascode stages provide a flat gain response, making the 1GG7-8045 an ideal wideband power block. Ebeam lithography is used to produce gate lengths of ~0.3 mm. The 1GG7-8045 incorporates advanced MBE technology, TiPtAu gate metallization, silicon nitride passivation, and polyimide for scratch protection.
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Laser Heads
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The laser head is the source of the laser beam used in all laser motion and position measurement systems. The primary difference between laser heads is in the velocity, reference frequency and optical output power. Other considerations are size, heat dissipation, and input power requirements. Which laser you choose depends primarily on the application in which it will be used. For example, semiconductor lithography systems typically have faster moving parts (stages), and therefore need higher velocities than machine tool applications.
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UV-NIL / SmartNIL® Systems
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EV Group provides a complete product line for UV-based nanoimprint lithography (UV-NIL), including different single-step imprinting systems, large-area imprinters as well as step-and-repeat systems for efficient master fabrication. Besides soft UV-NIL, EVG offers its proprietary SmartNIL technology with multiple-use polymer stamp technology. The efficient and robust SmartNIL process provides high pattern fidelity, highly uniform patterned layers and minimum residual layers, combined with easy scalability in wafer size and production volume. EVG´s SmartNIL redeems the long-term promise of nanoimprinting being a high-performance, low-cost and volume-capable manufacturing technology for mass production of micro- and nanoscale structures.
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Lithography Systems
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When it comes to shaping what a chip can do, lithography systems lead the way by transferring intricate circuit designs onto substrates with unmatched precision. From prototyping to high-volume manufacturing, these tools define the geometry of modern microchips, as well performance.
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Computational Lithography
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ASML's industry-leading computational lithography products enable accurate lithography simulations that help to improve chip yield and quality
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Laser Head
5517DL
Laser Head
The Keysight 5517DL is used primarily in VME and PC based laser interferometer systems where the velocity of motion is faster, such as semiconductor lithography and flat panel applications. Please contact Keysight for custom requirements.
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Laser Head
5517EL
Laser Head
The Keysight 5517EL is used primarily in VME and PC based laser interferometer systems where the velocity of motion is faster, such as semiconductor lithography and flat panel applications. Please contact Keysight for custom requirements.
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NanoFrazor Nanolithography Tool
NanoFrazor
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The NanoFrazor Nanolithography Tool represents a paradigm shift in nanofabrication, integrating cutting-edge Thermal Scanning Probe Lithography (t-SPL) technology to foster groundbreaking research and innovation in various fields. This versatile and modular system is adept at crafting intricate nanostructures, making it an ideal instrument for exploring quantum devices, 1D/2D materials, and nanoscale device arrays. With its ultrasharp heatable probe tip, the NanoFrazor not only writes but simultaneously inspects complex structures, optimizing patterning parameters in real-time for exceptional precision. The tool excels at creating grayscale patterns with vertical accuracies of less than 1 nm, thanks to its advanced software and noise-insulated design.
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VPG 300 DI Maskless Stepper
VPG 300 DI
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The VPG 300 DI is an innovative direct write lithography system that redefines the capabilities of microfabrication. Tailored specifically for high-resolution applications, the VPG 300 DI seamlessly integrates the precision of traditional i-line steppers with the advantages of a maskless workflow. Leveraging an ultra-high-speed exposure optical engine, this system accelerates the innovation cycle from weeks to mere hours while maintaining exceptional imaging quality and patterning accuracy. With a minimum feature size as small as 500 nm, this state-of-the-art equipment is engineered to meet the rigorous demands of both industrial environments and academic research.
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Product
Reticle/Mask Particle Remover
RP-1
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The RP-1 automatically removes particles from the reticle/mask by air (or N2) and vacuum suction. Routinely removing the particles before the lithography process extends the replacement cycle of the pellicle and cleaning cycle of the mask, thereby contributing to a reduction in running costs.
