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Product
Semiconductor
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Aerotech has a long history of engineering and manufacturing motion systems and components for high precision wafer processing, scanning electron microscopy (SEM), wafer bumping, 450 mm wafer manufacturing, lithography equipment and advanced laser micromachining. We also specialize in systems and components for vacuum applications, such as EUV lithography. So whether you need off-the-shelf wafer bumping components or a custom-engineered SEM system manufactured and tested to exacting specifications, Aerotech can provide the optimal solution for your application.
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Product
EUV Lithography
NXE systems
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NXE lithography systems are used in high-volume manufacturing of advanced Logic and Memory chips. The first systems to use ASML’s novel 13.5 nm EUV light source, they print microchip features with a resolution of 13 nm, which is unreachable with deep ultraviolet (DUV) lithography. Chipmakers use our NXE systems to print the highly complex foundation layers of their 7 nm, 5 nm and 3 nm nodes. Read about how EUV lithography went from imagination to reality.
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Product
Scanning Electron Microscope
E5620
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The E5620 is a MASK DR-SEM(∗) product for reviewing and classifying ultra-small defects in photomasks and mask blanks. It implements Advantest’s highly stable image capture technology to easily import defect location data from mask inspection systems and automatically image the locations. Compared to the E5610, our predecessor DR-SEM system, the E5620 features a number of improvements designed specifically to target mask requirements for extreme ultraviolet (EUV) lithography.
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Product
EUV Lithography
EXE systems
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EXE, or ‘High NA’, systems are the latest generation in EUV lithography. With a numerical aperture (NA) of 0.55, their innovative new optics provide higher contrast and print with a resolution of just 8 nm.
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Product
Gratings for Synchrotron, FEL and EUV Light Sources
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HORIBA Scientific holographic lamellar gratings exhibit ultra-low grooves roughness and unique efficiency uniformity making them ideal for Synchrotron, Free Electron Laser (FEL), EUV or Soft X-ray light sources.
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Product
wavefront sensors
HASO EUV
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Imagine Optic's HASO EUV wavefront sensor, developed in conjunction with LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today's demanding laboratory and industrial applications.
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Product
Electrodeless Z-Pinch™10 Watt EUV Source
EQ-10
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The EQ-10 is a compact, easy-to-use, reliable, and cost-effective EUV light source, based on Energetiq's proven Electrodeless Z-pinch™ technology using Xenon gas. The EQ-10 EUV source is uniquely suited for metrology and research applications.
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Product
Detectors
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Solar blind detector for operation in the 1 to 180 nanometer region. It is encased in a vacuum tight housing for vacuum operation. The Model 425 is ideal for measurements in the Extreme and Vacuum UV (EUV and VUV) where the solar blind feature eliminates potential interference from long wavelength ultraviolet and visible light. It may be operated in pulse-counting mode or DC. The CEM is also available with coatings like Cesium Iodide or Magnesium Fluoride to enhance response in different energy regions.
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Product
Dry Systems
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Chips are made up of many layers stacked on top of one another, and it’s not necessarily the latest and greatest immersion lithography machines that are used to produce these layers. In a given chip, there may be one or two more complicated layers that are made using an EUV lithography machine, but the rest can often be printed using ‘older’ technology such as dry lithography systems. This is certainly more cost-effective for customers, since these older machines are less expensive to purchase and maintain. Read about how dry lithography systems are enabling progress.
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Product
EUV Lithography Systems
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Using extreme ultraviolet (EUV) light, our NXE and EXE systems deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible
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Product
Patterning Simulation
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KLA’s patterning simulation systems use advanced models to explore critical-feature designs, manufacturability and process-limited yield of proposed lithography and patterning technologies. Our patterning simulation software allows researchers to evaluate advanced patterning technologies, such as EUV lithography and multiple patterning techniques, without the time and expense of printing hundreds of test wafers using experimental materials and prototype process equipment.
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Product
Immersion Systems
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Immersion systems are the workhorses of the industry. Our latest NXT machines have shown the ability to run in excess of 6,000 wafers per day, with an average five percent productivity increase over 12 months, supporting our customers' value requirements. We continue to innovate our immersion systems to meet the requirements of future nodes, benefiting from commonalities in R&D with our EUV program, while ensuring the platform’s extendibility through System Node Enhancement Package upgrades. Thanks to these packages, any NXT system can be upgraded to the latest technology.
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Product
Ultraviolet Light Distribution Measurement Film
UVSCALE
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UVSCALE is a film that responds to UV light, and changes color depending on the amount of light it is exposed. This makes it easy to see UV light distribution. There are a roll type and a sheet type, with three types for different amounts of light.
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Product
PCE-2000UV_1.5 Ultraviolet Light Radiation Measurement System
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Hangzhou Everfine Photo-E-Info Co., LTD
PCE-2000UV UV light source radiation Measurement system can realize the measurement of the relative spectral power distribution of ultraviolet LED, UV fluorescent lamp, UV light source, peak wavelength, half-peak wavelength, spectral radiation flux of UV-A/B/C, and the total radiation flux in specific wavelength.
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Product
Solar Ultraviolet Pyranometers
UVR1-T, UVR1-A, &
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The Middleton Solar UVR1 series are precision filter radiometers for measuring solar global ultraviolet irradiance. The UVR1-T and UVR1-A are suitable for air pollution monitoring. The UVR1-B is suitable for biological and human erythema (sunburn) monitoring.
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Product
Ultraviolet Microscope
UVM-1
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The UVM-1™ is a UV microscope that also can image in the visible and NIR. This UV-visible-NIR microscope embodies both advanced optics for cutting edge UV, color and NIR imaging and visualization. The system is a flexible design, very easy to use and very durable. It is designed with cutting edge CRAIC optics for the highest image quality and to give years of service.
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Product
Deep Ultraviolet Observation System for Microscope
U-UVF248
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Model Capable of High-magnification/High-contrast Deep Ultraviolet (DUV) Observation. A Semiconductor / FPD Inspection Microscopes.
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Product
Ultraviolet Meter
UVR Series
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UVR series is suitable to manage lamp of ultraviolet curing equipment, Also suitable to measure intensity of ultraviolet ray for sun light and lamp.
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Product
Light Sources
LS 150 Xenon Arc Lamp Source
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Model LS-150 is a Patented US Pat. No. 8116017 low cost, high output 150 watt Xe arc lamp based light source. The entire source, power supply, lamp, and optical compartment are housed in an extremely compact enclosure, 9 x 6 x 11 inches. The unit's base allows mounting on inch or metric spaced optical tables with the optics centered over the hole pattern to allow for easy integration with the rest of your setup.
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Product
Smart Lighting
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The AS721x/AS722x are complete System-on-Chip (SoC) sensor-integrated IoT smart lighting managers for color-tunable white lighting applications. They also support daylight harvesting and color/lumen maintenance lighting applications. 0-10V control and network-enabled high-level command inputs are combined with industry-standard PWM and 0-10V outputs for direct control of LED power systems.
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Light Sensor
NaPiCa
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Panasonic Industrial Devices Sales Company of America
Visible light sensor (Silicon Photo IC) that detects light and converts into electrical current. Consists of a photodiode and built-in amplifier. Optical filter provides spectral response similar to human eye sensitivity. Applications include: LCD Backlight Control, Commercial and Residential Lighting Brightness Control, Security Lighting.
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Product
Lighting ICs
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Based on its 30-year experience in power conversion and high-voltage technology, ST offers a wide portfolio of solutions for electronic ballasts, ranging from high-voltage ballast controllers for analog solutions (with or without embedded PFC), to complete power management units with integrated drivers and voltage regulator for digital platforms.
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Product
Extreme Temperature Active Probe, 1.5 GHz
N2797A
Oscilloscope Probe
Testing devices over extreme temperature ranges is quite common these days. The N2797A single-ended active probe is the industry’s first low-cost high input impedance active probe with rugged probe tips for environmental chamber testing of ICs and devices. It gives the ability to probe signals at drastic temperature swings ranging from –40 °C to +85 °C. The probe provides 1.5 GHz of bandwidth and a 2 m long cable.
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Product
Light Sources
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These external units provide illumination which is transmitted to the viewing instrument by a light guide cable, and then through the scope via the integral fiber bundle to the viewing tip.
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Product
Cameras and Lights
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MacArtney LUXUS cameras and lights are designed to combine operational and service flexibility, excellent performance and reliability.
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Product
Light Shaping
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VirtualLab Fusion supports light shaping by freeform surfaces, diffractive beam splitters and pattern generators, diffusers, and general arrays of micro-optical components, including, but not limited to, micro-lens arrays.
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Light Sources
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There are many low cost artificial light sources used for illumination or for industrial applications: tungsten or halogen bulbs, fluorescent lamps, LED lamps etc. Some of these sources have regulated intensity of emitted light. However, there very few calibrated light sources of precisely known parameters. A light source can be considered as calibrated when its user can precisely regulate its photometric/radiometric parameters like luminance (or illuminance), radiance (or irradiance) at defined spectrum of interest. Such light sources are needed in many applications among them, in systems for testing night vision devices, VIS-NIR cameras and SWIR imagers. Inframet offers a series of calibrated light sources that can be divides into three groups:
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Product
Extreme Temperature Passive Probe
N7007A
Oscilloscope Probe
Many environmental test engineers today are using standard-temperature probes in extreme temperature condition, which causes physical damage to the probe. Another common practice among environmental test engineers is to simply attach long wires at the end of their probes, which significantly degrades measurement performance due to excessive inductance and reduced bandwidth. Keysight addresses this issue with the N7007A single-end passive probe.
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Product
Light Simulator
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From the review of the scientific development history, reliable and stable artificial light sources have played a very important role in the past century. For example, the artificial solar simulator is an important part of simulating sunlight to ensure accurate performance of PV characterization. With the growth of light sensor applications, more and more requirement of light simulators (or artificial light sources) explored. One of the core technologies of Enlitech is the artificial light sources. We can manipulate different lamp types (short arc lamps, LEDs, filament lamps et. al.) to generate different spectrum-form in different light intensity levels, beam sizes, and wavelength ranges. We have launched different artificial light source products for different applications fields. For instance, SS-X series solar simulators and ILS-30 ambient light simulator are for the PV field, HAAS is highly accurate star light simulator for the space field, and ALS-300 is a general-purpose light source in science research field. These products can not only meet the needs of your application, but also speed up the process of your research or mass-production.
