-
Product
E-beam Metrology And Inspection
-
Our HMI e-beam solutions help to locate and analyze individual chip defects amid millions of printed patterns.
-
Product
BSE Detection
SLIM
-
SLIM™ is an innovative design for under-the-column BSE detection.SLIM™ puts El-Mul’s ScintiFast™ together with a segmented, shaped light guide and Silicon Photomultipliers (SiPM) to create a fast, sensitive, segmented and compact BSE detector for e-beam tools.
-
Product
Metrology & Inspection Systems
-
Our optical and e-beam wafer metrology and inspection products quickly and accurately measure pattern quality before and during high-volume chip manufacturing.
-
Product
Digital E-Gun Sweep
XYC-20
-
The XYC-20 E-beam evaporation controller is in a class by itself. The unit can be calibrated by the user to their specific system and e-gun. An algorithm determines the beam error from front to back and side to side within the pocket, eliminating pocket overshoot and burn-thru. The pattern control is effectively made linear saving time in programming and setup. Beam dwell time can vary at each location to compensate for variation in beam density. Six pocket sizes and two shapes can be selected.
-
Product
Sputter Coater & Freeze Fracture Solutions
-
To obtain high-quality images of samples with scanning (SEM) or transmission electron microscopy (TEM), your samples need to be conductive to avoid charging. If a sample does not have a high enough conductivity, then you can quickly cover it with a conductive layer using the method of sputter coating. Also, a carbon or e-beam evaporator coating can be used. Such coatings protect the sample, allow enhancing of the EM image contrast, or can act as a TEM-grid support film for small scale samples.
-
Product
E-Beam Power Supplies
-
Maximize image quality and repeatability. Designed for scanning electron microscope tools, Advanced Energy’s precision e-beam technologies deliver impressive performance, accuracy, and reliability.
-
Product
Nanostructuring
-
AMO offers a highly flexible process-platform for the fabrication of nanostructures. We have a broad range of lithography techniques that can be flexibly combined with each other – including interference lithography. Each lithography technique is tailored to a specific pattern-transfer process and can be used on a wide range of substrates. In addition, we have developed an advanced nanoimprint lithography process that can transfer e-beam-defined patterns to large areas in a cost-effective manner.
-
Product
2-26.5 GHz Traveling Wave Amplifier
1GG7-8045
Amplifier
The 1GG7-8045 is a broadband GaAs MMIC Traveling Wave Amplifier designed for high output power and moderate gain over the full 2 to 26.5 GHz frequency range. Seven MESFET cascode stages provide a flat gain response, making the 1GG7-8045 an ideal wideband power block. Ebeam lithography is used to produce gate lengths of ~0.3 mm. The 1GG7-8045 incorporates advanced MBE technology, TiPtAu gate metallization, silicon nitride passivation, and polyimide for scratch protection.
