Inductively Coupled Plasma
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Inductively Coupled Plasma Emission Spectroscopy
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Inductively Coupled Plasma Emission Spectroscopy
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Inductively Coupled Plasma Mass Spectrometer
ICPMS-2030
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With its newly developed collision cell and optimized internal structure, the ICPMS-2030 provides superior sensitivity. At the same time, thanks to the adoption of its proprietary mini-torch unit and provision of an Eco mode, the quantity of argon gas needed for analyses has been greatly reduced to the industry's lowest levels. As a result, low running costs are assured. The Development Assistant function of the software automatically sets the optimal analysis conditions for quantitative analysis. Then, after measurements are complete, the Diagnosis Assistant function automatically checks the validity of the necessary data. While reducing the burden on the user, the efficiency of analyses is enhanced and the reliability of the data can be increased. It complies with FDA 21 CFR Part 11.
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Inductively Coupled Plasma Spectrometry
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Is an analytical technique that can be used to measure elements at trace levels in biological fluids.
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Inductively Coupled Plasma Mass Spectrometry / ICP-MS Systems
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Agilent ICP-MS systems utilize innovative technology to deliver excellent sensitivity, accuracy, ease of use and productivity. Our 7800 and 7900 quadrupole ICP-MS systems offer the highest matrix tolerance, widest dynamic range and most effective interference removal for trace elements across most typical applications. The 8900 Triple Quadrupole ICP-MS (ICP-QQQ) adds MS/MS operation, providing precise control of reaction cell processes to ensure the most consistent and accurate results, resolving interferences that are beyond the capability of quadrupole and sector-field high resolution ICP-MS.
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Inductively Coupled Plasma Optical Emission Spectroscopy / ICP-OES Systems
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Industry-leading performance, speed and ease of use – no compromises
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Inductively Coupled Plasma
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Inductively Coupled Plasma Techniques can be very powerful tools for detecting and analyzing trace and ultra-trace elements. Over the past years, ICP-MS has become the technique of choice in many analytical laboratories for providing the accurate and precise measurements needed for today’s demanding applications and for providing required lower limits of detection.
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Inductively Coupled Plasma Optical Emission Spectrometer
EXPEC-6000
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An analytical technique used to determine how much of certain elements are in a sample.
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Chemical Analysis and Corrosion Testing
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Performing chemical analysis of metal alloys including both ferrous and non-ferrous alloys.Chemical analysis involves determining the chemical constituents of metals and related materials.An industry leader and co-operating laboratory for qualifying Calibration Standards for Chemical Analysis.Our chemical laboratory processes include Spectroscopy – Optical Emission Inductively Coupled Plasma, gas analysers, wet chemical, Intercrystalline/ Intergranular Corrosion (including G28, G48 etc).
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Inductively Coupled Plasma Spectroscopy (ICP-OES/MS), ICP Analysis Services
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ICP-OES measures the light emitted at element-specific characteristic wavelengths from thermally excited analyte ions . This light emitted is separated and measured in a spectrometer, yielding an intensity measurement that can be converted to an elemental concentration by comparison with calibration standards. ICP-MS (ICP-Mass Spec) measures the masses of the element ions generated by the high temperature argon plasma. The ions created in the plasma are separated by their mass to charge ratios, enabling the identifcation and quantitation of unknown materials. ICP-MS offers extremely high sensitivity (i.e. low detection limits) for a wide range of elements
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ICP Plasma System
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The AXIC IsoLok® Inductively Coupled Plasma (ICP) Load-Locked Processing System from AXIC, Inc. defines a new concept in Deep Reactive Ion Etch (DRIE) and low temperature-low damage Plasma Enhanced Chemical Vapor Deposition (ICP-PECVD) plasma processing. The system is based on a modular design starting with a universal chamber and cabinet unit with ICP etch or deposition bottom electrodes available for easy installation into the chamber unit combined with a load-lock. We are confident you will find the ease of use, variety of plasma processes, serviceability and attractive pricing unsurpassed by any other plasma product in the market.
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Threaded Coupling Adapter, G2, G6, G10, ITA, For Conduit Harnessing Assemblies/Clamps
410112599
Coupling Adapter
The Adapter is designed to accommodate military and commercial circular backshells for conduit or strain relief when designing for general and heavy-duty applications. The male thread size is 1.625-18 for this application.
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Coupling Decoupling Network
TBCDN-M3
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The TBCDN-M3 is a Coupling Decoupling Network for conducted immunity testing according to IEC 61000-4-6.
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Inductance Analyzer
3255B SERIES
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The 3255B range of Inductance Analyzers offers precision characterization of devices across a spectrum of conditions. Available in three versions – 3255BL (up to 200kHz), 3255B (up to 500kHz), and 3255BQ (up to 1MHz) – these analyzers are ideal for comprehensive parametric tests during the component development phase, assessing performance over diverse frequencies, AC drive levels, or DC bias currents.
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Coupling Decoupling Network
TBCDN-M4
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The TBCDN-M4 is a Coupling Decoupling Network for conducted immunity testing according to IEC 61000-4-6.
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Inductive Sensors
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In general, inductive proximity switches consist of four basic elements: a coil, an oscillator, a threshold switch and an output stage with short-circuit protection.The oscillator generates a high frequency, electromagnetic alternating field which is emitted from the active face of the coil.Eddy currents are induced in a metal object that enters this field. These eddy currents draw energy from both the electromagnetic field and from the oscillator which is consequently attenuated.The more energy taken the closer the metal object moves towards the active face. The threshold switch switches on the output stage at a defined attenuation value.In proximity switches with a DC voltage supply, this switch is designed as an NPN transistor which switches the connected load to the negative pole or as a PNP transistor which switches the load to the positive pole. The output stage is a thyristor or a triac in AC voltage switches.
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Capacitance and Inductance Tester
JY6700
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Capacitance measurementsInstrument can test take a single capacitor without stitches in test group capacitance to bring convenience to test. It will show test results of capacitance while show test
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CDNs - Coupling Decoupling Network
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Coupling Decoupling Networks, commonly called CDNs for IEC-61000-4-6 conducted immunity testing, serve the purpose of Injecting common mode disturbances These CDNs also ensures these signals do not interfere (decoupling) with auxiliary equipment connected to the device under test (DUT)
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Plasma Process Monitors
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Plasma process monitors to monitor plasma emissions during semiconductor manufacturing processes such as etching, sputtering and CVD.
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HV Coupling Capacitors
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Our high-voltage coupling capacitors are a main component of our partial discharge test stations. They serve to decouple the partial discharge impulses and act as a voltage divider, the output voltage of which is matched to our partial discharge measuring devices (with integrated voltage measurement) and peak voltage measuring devices. These high-voltage components are also available separately in their various designs, sizes, capacities and voltage ranges.
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Coupling Decoupling Network (CDNE)CDN
Emissions
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CDNEs are based on the CDN as specified in IEC61000-4-6 (Conducted RF Immunity test). In this test, the CDN is used for the coupling of RF onto a cable. In principle, the CDN can be used in reverse, ie coupling any RF on the cable out to an analyser. In an earlier version of EN 55015, these CDNs were specified as suitable for measuring emissions. However, the current version of the standard specifies a CDNE which is essentially a CDN refined to deliver higher accuracy particularly at higher frequencies.
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Inductive Heater
BD-1.01
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The device is assigned to heat the bars to the state, which allows upsetting. The DB-1.01 heater characterizes especially high watt-hour efficiency (bigger than 98%) thanks to suitable concentration of electromagnetic field in the heating zone of inductor (the solution secured by patent). It is possible to addapt the nductive heater BD-1.01 for heating any others bars.
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Power Induction Tester
MIG-ITU-K44
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The MIG-ITU-K44 is designed for power induction testing at line frequencies of 50 and 60Hz. Power induction tests need only be performed at the frequencies of the public power supply or railway power of the country of application. Basic and enhanced level tests can be performed according to ITU-T K44.
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Coupling Decoupling Network
TBCDN-M2
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The TBCDN-M2 is a Coupling Decoupling Network for conducted immunity testing according to IEC 61000-4-6.
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Cylindrical Inductive Proximity Sensor
GX-M SERIES
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Panasonic Industrial Devices Sales Company of America
The GX-M Series line of Cylindrical Inductive Sensors offer models with a wide range of sensing distances that are available with shielded or non-shielded 2, and 3 wiring configurations.
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Inductance Standard
1482 Series
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The GenRad 1482 Standard Inductors are the standard of choice in metrology labs. Used today by national metrology institutes and primary standards bodies around the world, these inductors have no peer or equivlent.
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Remote Plasma Sources
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Semiconductor and Electronic Thin Film applications use plasma sources to generate low-energy ions and radicals to react with material surfaces and chamber walls to remove contaminants and act as a precursor to aid in material deposition. MKS provides multiple options for radical generation including Toroidal and Microwave based Remote Plasma Sources supporting Fluorine, NF3, oxygen, nitrogen and hydrogen process chemistries.
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Inductive Sensors (eddy Current)
eddyNCDT
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Inductive sensors from Micro-Epsilon are based on the eddy current principle and designed for non-contact measurement of displacement, distance, position, oscillation and vibrations. They are particularly suitable when high precision is required in harsh industrial environments (pressure, dirt, temperature). Inductive sensors from Micro-Epsilon offer extremely precise measurements where sub-micron accuracy is required.
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Compact Inductive Proximity Sensor
GA-311/GH
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Panasonic Industrial Devices Sales Company of America
With a 3.3kHz response frequency, the GH Series Inductive Proximity Sensors are ideally suited for applications that require sensing of high-speed moving objects. These Proximity Sensors have the same form factor as Panasonic’s FX-300 Series Fiber Sensors and use the same shape quick-connection cables which, when used together, require minimal mounting space, but more importantly less power and wiring.
