Veeco Instruments Inc
Provides metrology and process equipment systems for industry leaders in the semiconductor, data storage, telecom/wireless and scientific/research markets.
- (516) 677-0200
- 1 Terminal Drive
Plainview, NY 11803
United States of America
-
Product
Low Temperature Gas Source
-
Get a low-cost means to introduce a gas without thermal pre-cracking using Veeco’s low-temperature gas source for molecular beam epitaxy (MBE) systems. The source features a large conductance tube for fast gas switching and a diffuser end plate for good growth uniformity. It is an ideal gas injector for CBr4 for carbon doping in GaAs and NH3 for GaN growth, as well as any other gases that do not require thermal pre-cracking. Enhance system capabilities further by combining the source on one mounting flange with an Atomic Hydrogen Source or 5cc Dopant Source.
-
Product
MBE Sources
-
Veeco offers MBE sources, including single- and dual-filament designs, tailored for numerous elements that require low, medium, or high temperatures.
-
Product
Single Filament Sources
-
Get a cost-effective solution that’s ideal for your high-volume, high-value MBE process needs with reliable Veeco Single Filament Sources. They feature dependable band thermocouples and single heater filaments for 750-1200°C operation. Three system configurations, and many crucible sizes, are available. All offer stable and consistent fluxes of high vapor pressure materials.
-
Product
Dual Filament Source
-
Get the optimal thermal profile for different materials and situations with the Veeco Dual Filament Source. This source is designed for growing high-quality Ga- and In-containing materials, while preventing charge material recondensation and significantly reducing defects. Dual Filament Sources are available for use with both SUMO and conventional crucibles (including Group III production crucibles).
-
Product
Gridless End-Hall Ion Sources
-
Veeco's Gridless End Hall Ion Sources provide high beam current for vacuum coating processes.
-
Product
Wet Processing Systems
-
Surface preparation using sustainable practices is critical to ensuring the reliability of your advanced microelectronics destined for automotive applications, medical devices, 5G and cloud storage.
-
Product
Downward-Looking SUMO Source For Gallium And Indium
-
Attain large capacity, excellent flux uniformity, negligible shutter flux transients, and minimal depletion effects with Veeco’s Downward-Looking SUMO® Source for MBE. It combines a dual filament source with an asymmetric SUMO crucible featuring a narrow offset orifice and tapered exit cone with hot-lip heating. Result: excellent material quality, low defect counts, and good thickness uniformity. NOTE: This source is not for use with aluminum.
-
Product
Gridded RF Ion Sources
-
Veeco's gridded RF ion sources are designed for improved production of long-run ion beam deposition processes.
-
Product
Dicing And Lapping Systems
-
In semiconductor fabrication, clean die separation and smooth surfaces can make all the difference. While these steps might come late in the process, they play a major role in how well a device ultimately performs. Dicing and lapping bring the necessary level of precision to cut wafers into individual dies and polish surfaces so everything fits, functions and holds up the way it should in real world scenarios.
-
Product
Diamond-Like Carbon: High-Performance Coatings for Extreme Applications
-
When durability matters, Diamond-Like Carbon (DLC) coatings deliver. Known for their hardness, low friction, and chemical resistance, DLC films are the go-to solution for protecting surfaces in high-stress environments: from precision mechanical parts to advanced semiconductor devices.
-
Product
Corrosive Series Valved Cracker
-
With the superior flux control of the Corrosive Series Valved Cracker, complex structures not possible with conventional thermally controlled sources can be achieved. Mixed Group V layers of varying compositions can be grown without the frequent recalibration procedures necessary when using standard sources. SIMS analysis of a continuously graded GaAs1-xSbx layer demonstrates the excellent flux control available when using two Group V valved crackers, with identical results achieved at two different growth rates.
-
Product
Atomic Layer Deposition Systems
-
Atomic Layer Deposition (ALD) is a powerful way to build ultra-thin, super-precise coatings, one atomic layer at a time. It’s especially useful and efficient when working with tiny, complex 3D structures, making it a go-to technique in advanced semiconductor manufacturing.
-
Product
5cc Dual Dopant Source
-
Attain precise and stable control of relatively low fluxes for dopant constituents in molecular beam epitaxy (MBE) through this compact dopant source. Its small thermal mass gives it excellent responsiveness, reproducibility, and stabilization for advanced doping profiles, plus consistent flux uniformity across an entire platen. Efficient cell heating minimizes thermal load.
-
Product
Deposition Systems
-
When a thin film requires the most stringent structural or compositional properties consistently across every layer, Veeco’s Ion Beam Deposition (IBD) technology is often the answer. Using a focused beam of ions to sputter material from a target, this physical vapor deposition technique builds dense, uniform films with standout adhesion and stability.
-
Product
Lithography Systems
-
When it comes to shaping what a chip can do, lithography systems lead the way by transferring intricate circuit designs onto substrates with unmatched precision. From prototyping to high-volume manufacturing, these tools define the geometry of modern microchips, as well performance.
